Method for finishing a glass product and glass product

1. A method for finishing a glass product comprising a glass layer, the glass layer comprising boron, the method comprising:

cleaning the glass layer in order to remove boron at a surface of the glass layer, wherein the step of cleaning comprises a substep of esterification using a medium comprising an alcohol, wherein the method comprises a process step of structuring the glass layer comprising a substep of lithography before performing the step of cleaning.

2. A method according to claim 1 , wherein the substep of esterification is performed as a chemical reaction of the alcohol and the boron.

3. A method according to claim 1 , wherein the glass product comprises a product selected from the group consisting of MEMS devices, LABS devices, electronic devices, electronic devices having a borophosphorsilicate layer as glass layer, and medical devices.

4. The method according to claim 1 , wherein the medium further comprises an acid.

5. The method according to claim 4 , wherein the acid has a purpose to perform a stabilization of the medium and/or a catalyzation of a chemical reaction of the substep of esterification.

6. The method according to claim 4 , wherein the acid has a percentage of 1% of the medium or a percentage within a range of 0.1% to 10% of the medium.

7. The method according to claim 1 , wherein the alcohol comprises an alcohol selected from the group consisting of ethanol, isopropanol and MeOH and combinations thereof.

8. The method according to claim 1 , wherein the alcohol comprises methanol.

9. The method according to claim 1 , wherein the cleaning is performed such that a boric concentration of the glass layer is reduced at least up to 75% at least at a depth of 100 nm.

10. The method according to claim 1 , wherein a process time of the cleaning lies within a range between 15 s and 300 s.

11. The method according to claim 1 , wherein the substep of esterification is performed at a temperature lying within a temperature range between 5° C. and 50° C.

12. The method according to claim 1 , wherein the cleaning is performed such that a boric concentration at a near surface of the glass layer is reduced by at least 75% up to a depth of 100 nm when compared to the boric concentration at a core of the glass layer.

13. The method according to claim 1 , wherein the step of cleaning comprises a process substep of glass etching before performing the substep of esterification.

14. The method according to claim 1 , wherein the step of cleaning comprises a process substep of drying using isopropanol after performing the substep of esterification.

15. The method according to claim 1 , wherein the step of cleaning includes a process step of hard mask stripping after the substep of esterification.

16. The method according to claim 1 , wherein the structuring comprises depositing of a hardmask, resist baking, plasma hardmask etching and/or wet-chemical glass washing.

17. The method according to claim 1 , wherein the method comprises a process step of initial etching before performing the step of structuring.

18. A method for manufacturing a glass substrate that comprises boron, the method comprising:

structuring the glass substrate including performing a lithography step; and

cleaning the glass substrate in order to remove boron at a near surface of the glass substrate up to a depth of 100 nm of the glass substrate, wherein the cleaning comprises esterification using a medium comprising more than 80% of MeOH and less than 5% of H 2 SO 4 .

19. A method for finishing a glass product comprising a glass layer, the glass layer comprising boron, the method comprising:

cleaning the glass layer in order to remove boron at a surface of the glass layer, wherein the step of cleaning comprises a substep of esterification using a medium comprising an alcohol, wherein the step of cleaning includes a process step of hard mask stripping after the substep of esterification.