Field effect transistor contacts
View Patent ↗A first field effect transistor (FET) device includes a first gate over a first channel region of a first fin arranged on a substrate, a second gate of a second FET device over a second channel region of a second fin arranged on the substrate, the second channel region having a width that is greater than a width of the first channel region, a first cavity that exposes an active region of the first FET device and a second cavity that exposes an active region of the second FET device, and a conductive material in the first cavity to define a first contact and a conductive material in the second cavity to define a second contact, the second contact having a width that is greater than a width of the first contact.
1. A field effect transistor device comprising:
a first fin arranged on a substrate;
a second fin arranged on the substrate;
a first gate stack arranged on the first fin;
a second gate stack arranged on the second fin, the first gate stack having a width that is greater than a width of the second gate stack;
a first conductive contact electrically communicative with an active region of the first fin; and
a second conductive contact electrically communicative with an active region of the second fin, the first conductive contact having a width that is greater than a width of the second conductive contact.
2. The device of claim 1 , further comprising an insulator layer arranged between the first conductive contact and the second conductive contact.
3. The device of claim 1 , wherein the first fin includes a semiconductor material.
4. The device of claim 1 , wherein the first conductive contact includes a metallic material.
5. The device of claim 1 , wherein the substrate includes an insulator material.
6. The device of claim 1 , wherein the gate stack includes a metallic gate material.