System and method for wafer alignment and centering with CCD camera and robot

1. A wafer alignment system comprising:

an image capture module that captures an image of a wafer positioned on a robot;

an image analysis module that analyzes the image to determine a position of the wafer on the robot while the wafer is positioned on the robot, wherein the determined position includes both a lateral position of the wafer relative to the robot and a rotational position of the wafer relative to the robot, and wherein the rotational position of the wafer corresponds to rotation of the wafer on an axis defined by a center of the wafer,

wherein the robot includes reference markings for determining the rotational position of the wafer relative to the robot, wherein the reference markings are in a non-linear arrangement on the robot, and wherein the image analysis module locates the reference markings and determines the rotational position of the wafer relative to the robot in accordance with (i) parameters of the non-linear arrangement of the reference markings and (ii) one or more features of the wafer;

a position correction module that calculates adjustment data based on the determined position of the wafer on the robot, wherein the adjustment data corresponds to respective adjustments to the lateral position of the wafer relative to the robot and the rotational position of the wafer relative to the robot; and

a system control module that controls the robot to at least one of place the wafer and retrieve the wafer based on the calculated adjustment data and a nominal wafer position on the robot.

2. The wafer alignment system of claim 1 , wherein the image capture module is arranged in a location along a path of the robot from a retrieval location of the wafer to a destination of the wafer.

3. The wafer alignment system of claim 1 , wherein the image capture module is located above a pedestal of a load lock.

4. The wafer alignment system of claim 1 , wherein, to capture the image of the wafer, the image capture module captures the image of the wafer in response to an indication that the robot is in a predetermined position.

5. The wafer alignment system of claim 1 , wherein the reference markings include at least three markings.

6. The wafer alignment system of claim 5 , wherein the at least three markings are arranged in a triangle.

7. The wafer alignment system of claim 1 , wherein the one or more features of the wafer include at least one of an edge of the wafer, a notch formed in the edge of the wafer, and the center of the wafer.

8. The wafer alignment system of claim 1 , wherein, to calculate the adjustment data, the position correction module calculates the adjustment data further based on the nominal wafer position on the robot.

9. The wafer alignment system of claim 1 , wherein the one or more features of the wafer include a chord line of the wafer.

10. The wafer alignment system of claim 1 , wherein the parameters include an angle of the non-linear arrangement of the reference markings.

11. A wafer alignment method comprising:

capturing an image of a wafer positioned on a robot while the wafer is positioned on the robot;

analyzing the image to determine a position of the wafer on the robot, wherein the determined position includes both a lateral position of the wafer relative to the robot and a rotational position of the wafer relative to the robot, and wherein the rotational position of the wafer corresponds to rotation of the wafer on an axis defined by a center of the wafer,

wherein the robot includes reference markings for determining the rotational position of the wafer relative to the robot, wherein the reference markings are in a non-linear arrangement on the robot, and wherein analyzing the image includes locating the reference markings and determining the rotational position of the wafer relative to the robot in accordance with (i) parameters of the non-linear arrangement of the reference markings and (ii) one or more features of the wafer;

calculating adjustment data based on the determined position of the wafer on the robot, wherein the adjustment data corresponds to respective adjustments to the lateral position of the wafer relative to the robot and the rotational position of the wafer relative to the robot; and

controlling the robot to at least one of place the wafer and retrieve the wafer based on the calculated adjustment data and a nominal wafer position on the robot.

12. The wafer alignment method of claim 11 , wherein capturing the image of the wafer includes capturing the image of the wafer from a location along a path of the robot from a retrieval location of the wafer to a destination of the wafer.

13. The wafer alignment method of claim 11 , wherein capturing the image of the wafer includes capturing the image of the wafer from a location above a pedestal of a load lock.

14. The wafer alignment method of claim 11 , wherein capturing the image of the wafer includes capturing the image of the wafer in response to an indication that the robot is in a predetermined position.

15. The wafer alignment method of claim 11 , wherein the reference markings include at least three markings.

16. The wafer alignment method of claim 15 , wherein the at least three markings are arranged in a triangle.

17. The wafer alignment method of claim 11 , wherein the one or more features of the wafer include at least one of an edge of the wafer, a notch formed in the edge of the wafer, and the center of the wafer.

18. The wafer alignment method of claim 11 , wherein calculating the adjustment data includes calculating the adjustment data further based on the nominal wafer position on the robot.

19. The method of claim 11 , wherein the one or more features of the wafer include a chord line of the wafer.

20. The method of claim 11 , wherein the parameters include an angle of the non-linear arrangement of the reference markings.