IP Library Granted Patent US 9,873,948
Granted Patent B2
US 9,873,948 · App. 14/824,167 · Granted Jan 23, 2018

Feroelectric ceramics and method for manufacturing the same

Inventor: Takeshi Kijima (Chiba, JP)
Assignee: YOUTEC CO., LTD.
C23C28/042C23C14/025C23C14/088C23C14/5853H01L41/0815H01L41/1876H01L41/316H01L41/318H01L41/319H01L41/0478
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Quick Facts
Patent No.
US 9,873,948
App. No.
14/824,167
Granted
Jan 23, 2018
Kind
B2
Abstract

To enhance piezoelectric property. One aspect of the present invention is ferroelectric ceramics including a Pb(Zr 1-x Ti x )O 3 film, wherein: the x satisfies the following formula 1, the Pb(Zr 1-x Ti x )O 3 film has a plurality of columnar single crystals, the x axis, the y axis and the z axis of each of the plurality of columnar single crystals are oriented in the same direction, respectively, 0<x<1  formula 1.

Claims (50)

1. A ferroelectric ceramic comprising a Pb(Zr 1-x Ti x )O 3 film, wherein:

x satisfies the following formula 1,

0<x<1  formula 1,

the Pb(Zr 1-x Ti x )O 3 film comprises a plurality of columnar single crystals and a PbO wall is formed around each of the plurality of columnar single crystals, and

an x axis, a y axis and a z axis of each of the plurality of columnar single crystals are oriented in a same direction, respectively.

2. The ferroelectric ceramic according to claim 1 , wherein:

the Pb(Zr 1-x Ti x )O 3 film is formed on a Pb(Zr 1-A Ti A )O 3 film,

the A and x satisfy the following formula 2 and formula 3,

0≦A≦0.1  formula 2

A<x  formula 3.

3. The ferroelectric ceramic according to claim 1 , wherein a plane z of the z axis has a plane (001).

4. The ferroelectric ceramic according to claim 1 , wherein the Pb(Zr 1-x Ti x )O 3 film has a ratio of elements of Pb:(Zr 1-x +Ti x ) of (1.4 to 1.1):1.

5. The ferroelectric ceramic according to claim 1 , wherein the Pb(Zr 1-A Ti A )O 3 film has a ratio of elements of Pb:(Zr 1-A +Ti A ) of (1.4 to 1.1):1.

6. The ferroelectric ceramic according to claim 1 , wherein:

a Pb(Zr 1-y Ti y )O 3 film is formed on the Pb(Zr 1-x Ti x )O 3 film, and

the Pb(Zr 1-y Ti y )O 3 film has a ratio of elements of Pb:(Zr 1-y +Ti y ) of (1.05 to 1):1, and

the y satisfies the following formula 4,

0<y<1  formula 4.

7. The ferroelectric ceramic according to claim 6 , wherein the ratio of elements of Pb:(Zr 1-y +Ti y ) is 1:1.

8. The ferroelectric ceramic according to claim 1 , wherein:

the A is 0, and

the Pb(Zr 1-A Ti A )O 3 is a PbZrO 3 film.

9. The ferroelectric ceramic according to claim 1 , wherein the Pb(Zr 1-A Ti A )O 3 film is formed on an oxide film.

10. The ferroelectric ceramic according to claim 9 , wherein the oxide film is an SrRuO 3 (SRO) film or an Sr(Ti,Ru)O 3 film.

11. The ferroelectric ceramic according to claim 1 , wherein the Pb(Zr 1-A Ti A )O 3 film is formed on an electrode film.

12. The ferroelectric ceramic according to claim 11 , wherein the electrode film is made of an oxide or a metal.

13. The ferroelectric ceramic according to claim 11 , wherein the electrode film is a Pt film or an Ir film.

14. The ferroelectric ceramic according to claim 11 , wherein the electrode film is formed on a ZrO 2 film.

15. The ferroelectric ceramic according to claim 11 , wherein the electrode film is formed on a Si substrate.

16. A method for manufacturing a ferroelectric ceramic comprising the steps of:

forming, on a substrate, a Pb(Zr 1-A Ti A )O 3 film comprising a plurality of columnar single crystals and a PbO wall formed around each of the plurality of columnar single crystals by coating, onto the substrate, a precursor solution for forming the Pb(Zr 1-A Ti A )O 3 film to which Pb is excessively added by 10 atomic % or more to 40 atomic % or less, and by performing crystallization under a pressurized oxygen atmosphere, and

forming, on the Pb(Zr 1-A Ti A )O 3 film, a Pb(Zr 1-x Ti x )O 3 film comprising a plurality of columnar single crystals and a PbO wall formed around each of the plurality of columnar single crystals by sputtering a sputtering target for the Pb(Zr 1-x Ti x )O 3 having a ratio of elements of Pb:(Zr 1-x +Ti x ) of (1.4 to 1.1):1, wherein

A and x satisfy the following formulas 1 to 3,

0<x<1  formula 1

0≦A≦0.1  formula 2

A<x  formula 3.

17. A method for manufacturing a ferroelectric ceramic comprising the steps of:

forming, on a substrate, a Pb(Zr 1-A Ti A )O 3 film comprising a plurality of columnar single crystals and a PbO wall formed around each of the plurality of columnar single crystals by coating, onto the substrate, a precursor solution for forming the Pb(Zr 1-A Ti A )O 3 film to which Pb is excessively added by 10 atomic % or more to 40 atomic % or less, and by performing crystallization under a pressurized oxygen atmosphere, and

forming, on the Pb(Zr 1-A Ti A )O 3 film, a Pb(Zr 1-x Ti x )O 3 film comprising a plurality of columnar single crystals and a PbO wall formed around each of the plurality of columnar single crystals by coating, onto the Pb(Zr 1-A Ti A )O 3 film, a precursor solution for forming the Pb(Zr 1-x Ti x )O 3 film to which Pb is excessively added by 10 atomic % or more to 40 atomic % or less, and by performing crystallization under a pressurized oxygen atmosphere, wherein

A and x satisfy the following formulas 1 to 3,

0<x<1  formula 1

0≦A≦0.1  formula 2

A<x  formula 3.

18. The method for manufacturing the ferroelectric ceramic according to claim 16 , further comprising the step of: after the step of forming the Pb(Zr 1-x Ti x )O 3 film, forming a Pb(Zr 1-y Ti y )O 3 film on the Pb(Zr 1-x Ti x )O 3 film by coating, onto the Pb(Zr 1-x Ti x )O 3 film, a precursor solution for forming the Pb(Zr 1-y Ti y )O 3 film to which Pb is excessively added by 0 atomic % or more to 5 atomic % or less, and by performing crystallization under a pressurized oxygen atmosphere, wherein

the y satisfies the following formula 4,

0<y<1  formula 4.

19. The method for manufacturing the ferroelectric ceramic according to claim 18 , wherein a ratio of elements of the Pb:(Zr 1-y +Ti y )O 3 is 1:1.

20. The method for manufacturing the ferroelectric ceramic according to claim 16 , wherein:

the A is 0, and

the Pb(Zr 1-A Ti A )O 3 is a PbZrO 3 film.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Jul 1, 2022
From: ADVANCED MATERIAL TECHNOLOGIES, INC.
To: UMI I INVESTMENT LIMITED PARTNERSHIP
Reel/Frame 060572/0037 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 1, 2022
From: ADVANCED MATERIAL TECHNOLOGIES, INC.
To: KRYSTAL INC.
Reel/Frame 060572/0227 →
SECURITY INTEREST Recorded Jan 25, 2022
From: ADVANCED MATERIAL TECHNOLOGIES, INC.
To: UMI I INVESTMENT LIMITED PARTNERSHIP
Reel/Frame 058763/0517 →
CHANGE OF NAME Recorded Jun 29, 2018
From: YOUTEC CO., LTD.
To: ADVANCED MATERIAL TECHNOLOGIES, INC.
Reel/Frame 046463/0924 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 30, 2015
From: KIJIMA, TAKESHI
To: YOUTEC CO., LTD.
Reel/Frame 036688/0007 →
Priority Claims (1)
JP 2014-165305 · Aug 14, 2014 · national
Continuity (1)
Related Publication 20160049577A1 · Feb 18, 2016