Apparatus and methods for aligned servo-related features
Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
1. An apparatus, comprising:
a first region of a substrate corresponding to a data region in a patterned recording medium;
a first set of protrusions etched out of the first region of the substrate,
wherein the protrusions of the first set of protrusions are rectangle shaped;
a second region of the substrate corresponding to a servo region in a patterned recording medium; and
a second set of protrusions etched out of the second region of the substrate,
wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
2. The apparatus of claim 1 ,
wherein the protrusions of the second set of protrusions are radially aligned along the radial lines etched into the substrate.
3. The apparatus of claim 1 ,
wherein the protrusions of the first set of protrusions are radially aligned along the radial lines etched into the substrate and circumferentially aligned along circumferential lines etched into the first region of the substrate.
4. The apparatus of claim 1 ,
wherein the substrate is configured to transmit ultraviolet light.
5. The apparatus of claim 1 ,
wherein the apparatus comprises a UV-transmissible nanoimprint template comprising the first and second sets of protrusions for patterned recording media.
6. A method, comprising:
transferring a first pattern comprising radial lines to a first region and a second region of a substrate,
wherein the first region and the second region respectively correspond to a data region and a servo region in a patterned recording medium; and
transferring a second pattern comprising circumferential lines and chevrons to the first region and the second region of the substrate, respectively,
wherein transferring the first pattern and the second pattern to the substrate creates radially aligned, rectangle-shaped protrusions in the first region of the substrate and radially aligned, chevron-derived protrusions in the second region of the substrate.
7. The method of claim 6 , further comprising:
superimposing the first pattern and the second pattern in a cross-imprinting process,
wherein a first sub-template comprises the first pattern, and
wherein a second sub-template comprises the second pattern.
8. The method of claim 7 ,
wherein the first pattern and the second pattern are superimposed with a radial displacement ≦10 nm.
9. The method of claim 7 ,
wherein the first pattern and the second pattern are superimposed with an angular displacement ≦250 nrad.
10. The method of claim 6 ,
wherein the rectangle-shaped protrusions and the chevron-derived protrusions have the same circumferential pitch in accordance with the radial lines of the first pattern.
11. The method of claim 6 ,
wherein transferring the first pattern and the second pattern to the substrate further creates radially aligned, line-shaped protrusions or radially aligned, square-shaped protrusions in the second region of the substrate.
12. The method of claim 6 ,
wherein transferring the first pattern and the second pattern to the substrate comprises etching the first pattern and the second pattern into a UV-transmissible substrate.
13. A method, comprising:
transferring a first pattern comprising radial lines to a servo region of a substrate corresponding to a servo region in a patterned recording medium; and
transferring a second pattern comprising chevrons to the servo region of the substrate,
wherein transferring the first pattern and the second pattern creates radially aligned, chevron-derived protrusions in the second region of the substrate.
14. The method of claim 13 , further comprising:
transferring the first pattern to a data region of the substrate corresponding to a data region in a patterned recording medium; and
transferring the second pattern further comprising circumferential lines to the data region of the substrate,
wherein transferring the first pattern and the second pattern creates radially aligned, rectangle-shaped protrusions in the first region of the substrate.
15. The method of claim 13 , further comprising:
superimposing a first sub-template comprising the first pattern and a second sub-template comprising the second pattern in a cross-imprinting process.
16. The method of claim 15 ,
wherein superimposing the first sub-template and the second sub-template comprises superimposing with a radial displacement ≦100 nm and an angular displacement ≦2500 nrad.
17. The method of claim 15 , further comprising:
forming a topographical pre-pattern to the second pattern in a precursor to the second sub-template; and
performing directed self-assembly of a block copolymer to form a nanoline-based pattern of block copolymer nanolines parallel or perpendicular to guiding features of the topographical pre-pattern to the second pattern.
18. The method of claim 17 ,
wherein the nanolines are perpendicular to the guiding features of the topographical pre-pattern.
19. The method of claim 17 , further comprising:
forming a topographical pre-pattern to the first pattern in a precursor to the first sub-template; and
performing directed self-assembly of a block copolymer to form a nanoline-based pattern of block copolymer nanolines parallel to guiding features of the topographical pre-pattern to the first pattern.
20. The method of claim 19 , further comprising:
transferring each of the nanoline-based patterns to their respective sub-templates for the cross-imprinting process.