Plasma processing apparatus
View Patent ↗A plasma processing apparatus, to which process control such as APC is applied, includes: a processing chamber in which plasma processing is performed on a sample; and a plasma processing control device which performs control to optimize a condition for plasma processing which recovers the status inside a processing chamber, in which plasma processing is performed, based on a waiting time from the time when plasma processing for a second lot, which is a lot immediately before a first lot, is completed to the time when plasma processing for the first lot is started, and the content of plasma processing for the second lot.
1. A plasma processing apparatus comprising:
a processing chamber in which a sample in a lot, said lot comprising a collection of one or more samples, is plasma-processed using control to reduce a variation in plasma processing with feedback control or feed-forward control;
a first correction amount calculator configured to calculate a first correction amount;
a second correction amount calculator configured to calculate a second correction amount;
a process history database storage device operatively coupled to the first and second correction amount calculators; and
a plasma processing control device coupled to the process history database storage device and configured to control to correct a condition for recovery processing for a first lot based on a waiting time and a content of plasma processing for a second lot, the second lot being a lot for which plasma processing was already performed before the first lot, the waiting time being a time period from a time when plasma processing for the second lot is completed to a time when plasma processing for the first lot is started, the condition for recovery processing for the first lot being plasma processing for recovering a status inside the processing chamber so that said status inside the processing chamber becomes a desired status,
wherein the second correction amount calculator is configured to calculate the second correction amount using the first correction amount, a history coefficient of a plasma processing condition for the second lot stored in the process history database storage device, and a history coefficient regarding a number of sheets of samples of the second lot stored in the process history database storage device, and
wherein the history coefficient of a plasma processing condition is a value indicating a degree of influence of the content of plasma processing for the second lot on the variation in plasma processing, and the history coefficient regarding a number of sheets of samples is a value indicating a degree of influence of the number of samples of the second lot on a variation in plasma processing.
2. The plasma processing apparatus according to claim 1 , wherein the plasma processing control device is configured to control based on, further, a content of plasma processing for the first lot.
3. The plasma processing apparatus according to claim 1 , wherein the content of plasma processing is a plasma processing condition for the second lot.
4. The plasma processing apparatus according to claim 1 , wherein the second lot is a plurality of lots on each of which plasma processing is performed.
5. The plasma processing apparatus according to claim 1 , wherein the plasma processing control device comprises:
a waiting time monitoring unit which monitors the waiting time,
a recipe history acquisition unit configured to obtain said history coefficient of a plasma processing condition; and
a wafer history acquisition unit configured to obtain said history coefficient regarding a number of sheets of samples,
wherein the first correction amount calculation unit calculates a first correction amount for the condition for recovery processing using the waiting time and a control model, the waiting time being monitored by the waiting time monitoring unit, the control model indicating a correlation between a waiting time acquired in advance and a correction amount of a prescribed item of the condition for recovery processing, and
wherein the plasma processing control device is configured to correct a pre-set condition for recovery processing for the first lot by the second correction amount.
6. A plasma processing apparatus comprising:
a processing chamber in which a sample in a lot, said lot comprising a collection of one or more samples, is plasma-processed using control to reduce a variation in plasma processing with feedback control or feed-forward control;
a first correction amount calculator configured to calculate a first correction amount;
a second correction amount calculator configured to calculate a second correction amount;
a process history database storage device operatively coupled to the first and second correction amount calculators; and
a plasma processing control device coupled to the process history database storage device and configured to control to select from a plurality of conditions for recovery processing a condition for recovery processing for a first lot based on a waiting time and a content of plasma processing for a second lot, the second lot being a lot for which plasma processing was already performed before the first lot, the waiting time being a time period from a time when plasma processing for the second lot is completed to a time when plasma processing for the first lot is started, the condition for recovery processing for the first lot being plasma processing for recovering a status inside the processing chamber so that said status inside the processing chamber becomes a desired status,
wherein the second correction amount calculator is configured to calculate the second correction amount using the first correction amount, a history coefficient of a plasma processing condition for the second lot stored in the process history database storage device, and a history coefficient regarding a number of sheets of samples of the second lot stored in the process history database storage device, and
wherein the history coefficient of a plasma processing condition is a value indicating a degree of influence of the content of plasma processing for the second lot on the variation in plasma processing, and the history coefficient regarding a number of sheets of samples is a value indicating a degree of influence of the number of samples of the second lot on a variation in plasma processing.
7. The plasma processing apparatus according to claim 6 , wherein the plasma processing control device is configured to control based on, further, a content of plasma processing for the first lot.
8. The plasma processing apparatus according to claim 6 , wherein the content of plasma processing is a plasma processing condition for the second lot.
9. The plasma processing apparatus according to claim 6 , wherein the second lot is a plurality of lots on each of which plasma processing is performed.