Plasma processing apparatus

1. A plasma processing apparatus comprising:

a waveguide which is connected with a vacuum vessel, and through which an electric field for plasma generation propagates;

a generator of the electric field which is connected to the waveguide;

a circular waveguide which configures the waveguide and is arranged between the generator of the electric field and the vacuum vessel, which has a circular cross-section, and through which a circularly polarized wave of the electric field propagates;

a processing chamber which is arranged in the vacuum vessel below the circular waveguide, and inside of which the electric field is supplied and the plasma is generated;

a circularly polarized wave generator which is arranged in the waveguide;

a circularly polarized wave corrector which is arranged to be connected to the circular waveguide below the circularly polarized wave generator, and which is configured to adjust distribution of the circularly polarized wave in the circular waveguide;

a circularly polarized wave detector which is configured to detect the distribution of the circularly polarized wave in the circular waveguide below the circularly polarized wave corrector, wherein the circularly polarized wave corrector comprises a plurality of the dielectric stubs inserted in a direction perpendicular to an axis of the circular waveguide; and

a controller which is configured to adjust an operation of the circularly polarized wave corrector according to an output from the circularly polarized wave detector, and based on a signal from which the circularly polarized wave corrector is configured to adjust a length of each of said dielectric stubs to protrude into the circular waveguide.

2. The plasma processing apparatus according to claim 1 , further comprising:

a matching unit which is arranged between the circularly polarized wave corrector on the waveguide and the generator of the electric field.

3. The plasma processing apparatus according to claim 2 ,

wherein the waveguide comprises a horizontal waveguide which is arranged above the circular waveguide, at a first end portion in an axial direction extending in a horizontal direction of which the generator of the electric field is connected, and at a second end portion of which the circular waveguide is connected, and

wherein the circularly polarized wave generator is located below a connection portion of the horizontal waveguide and the circular waveguide, and between the connection portion and the circularly polarized wave corrector.

4. The plasma processing apparatus according to claim 1 ,

wherein the waveguide comprises a horizontal waveguide which is arranged above the circular waveguide, at a first end portion in an axial direction extending in a horizontal direction of which the generator of the electric field is connected, and at a second end portion of which the circular waveguide is connected, and

wherein the circularly polarized wave generator is located below a connection portion of the horizontal waveguide and the circular waveguide, and between the connection portion and the circularly polarized wave corrector.

5. A plasma processing apparatus comprising:

a waveguide which is connected with a vacuum vessel, and through which an electric field for plasma generation propagates;

a generator of the electric field which is connected to the waveguide;

a circular waveguide which configures the waveguide and is arranged between the generator of the electric field and the vacuum vessel, which has a circular cross-section, and through which a circularly polarized wave of the electric field propagates;

a processing chamber which is arranged in the vacuum vessel below the circular waveguide, and inside of which the electric field is supplied and the plasma is generated;

a circularly polarized wave generator which is arranged in the waveguide;

a circularly polarized wave corrector which is arranged to be connected to the circular waveguide below the circularly polarized wave generator, and which is configured to adjust distribution of the circularly polarized wave in the circular waveguide;

a circularly polarized wave detector which is configured to detect the distribution of the circularly polarized wave in the circular waveguide below the circularly polarized wave corrector,

wherein the circularly polarized wave generator is located below a connection portion of the horizontal waveguide and the circular waveguide, and between the connection portion and the circularly polarized wave corrector; and

a controller which adjusts an operation of the circularly polarized wave corrector according to an output from the circularly polarized wave detector, and based on a signal from which the circularly polarized wave corrector is configured to adjust a length of each of a plurality of dielectric stubs to protrude into the circular waveguide.

6. The plasma processing apparatus according to claim 5 , further comprising:

a matching unit which is arranged between the circularly polarized wave corrector on the circular waveguide and the generator of the electric field.

7. The plasma processing apparatus according to claim 6 , wherein the circularly polarized wave corrector comprises a plurality of the dielectric stubs inserted in a direction perpendicular to an axis of the circular waveguide.

8. The plasma processing apparatus according to claim 5 , wherein the circularly polarized wave corrector comprises a plurality of the dielectric stubs inserted in a direction perpendicular to an axis of the circular waveguide.