Semiconductor device having air gap and method for manufacturing the same, memory cell having the same and electronic device having the same
A semiconductor device including a semiconductor substrate including a plurality of active regions and a device isolation region for isolating the plurality of active regions; and a buried bit line and a buried gate electrode which are formed in the semiconductor substrate. The device isolation region includes a first device isolation region extending in a first direction and a second device isolation region extending in a second direction crossing with the first direction and having a shield pillar formed therein.
1. A semiconductor device comprising:
a semiconductor substrate having a plurality of active regions and a device isolation region for isolating the plurality of active regions from each other; and
a buried bit line and a buried gate electrode which are formed in the semiconductor substrate,
wherein the device isolation region includes a first device isolation region extending in a first direction and a second device isolation region extending in a second direction crossing with the first direction and having a shield pillar,
wherein the shield pillar has a height that overlaps a portion of the buried gate electrode and the buried bit line,
wherein a top surface of the shield pillar being at a higher level than a bottom surface of the buried gate electrode, and
wherein a bottom surface of the shield pillar being at lower level than a bottom surface of the buried bit line.
2. The semiconductor device according to claim 1 , wherein the shield pillar is electrically coupled to the semiconductor substrate.
3. The semiconductor device according to claim 1 , wherein the shield pillar comprises polysilicon doped with boron.
4. The semiconductor device according to claim 1 , further comprising a first isolation trench extending in the first direction, and wherein the first device isolation region is formed in the first isolation trench.
5. The semiconductor device according to claim 1 , further comprising a second isolation trench extending in the second direction, and wherein the second device isolation region is formed in the second isolation trench.
6. The semiconductor device according to claim 5 , wherein the second device isolation region comprises:
a liner formed on sidewalls of the second isolation trench; and
an isolation dielectric layer covering the shield pillar,
wherein the liner is positioned between the shield pillar and a sidewall of the second isolation trench.
7. The semiconductor device according to claim 1 , further comprising:
a body trench under the buried bit line; and
a punch-through preventing layer formed in the body trench.
8. The semiconductor device according to claim 1 , wherein each of the active region has a major axis and a minor axis, the first isolation region is positioned between the minor axes of neighboring active regions, and the second isolation region is positioned between the major axes of the neighboring active regions.
9. The semiconductor device according to claim 8 , wherein the shield pillar is positioned between the major axes of the neighboring active regions.
10. A semiconductor device comprising:
a semiconductor substrate having a plurality of active regions and a device isolation region for isolating the plurality of active regions from each other; and
a buried bit line and a buried gate electrode which are formed in the semiconductor substrate,
wherein the device isolation region comprises a first device isolation region extending in a first direction and a second device isolation region extending in a second direction crossing with the first direction, and having an air gap and a conductive shield pillar,
wherein each of the active region is defined by the first device isolation region and the second device isolation region,
wherein the conductive shield pillar has a height that overlaps a portion of the buried gate electrode and the buried bit line,
wherein a top surface of the conductive shield pillar being at a higher level than a bottom surface of the buried gate electrode, and
wherein a bottom surface of the conductive shield pillar being at lower level than a bottom surface of the buried bit line.
11. The semiconductor device according to claim 10 , wherein the conductive shield pillar is electrically coupled to the semiconductor substrate.
12. The semiconductor device according to claim 10 , wherein the conductive shield pillar comprises polysilicon doped with boron.
13. The semiconductor device according to claim 10 , wherein the second device isolation region comprises an isolation dielectric layer covering the conductive shield pillar and the air gap.
14. The semiconductor device according to claim 10 , wherein each of the active region has a minor axis and a major axis, the first device isolation region is positioned between the minor axes of neighboring active regions, and the second device isolation region is positioned between the major axes of the neighboring active regions.
15. A semiconductor device comprising:
a semiconductor substrate including a plurality of active regions and a device isolation region for isolating the plurality of active regions from each other; and
a buried bit line and a buried gate electrode which are formed in the semiconductor substrate,
wherein the device isolation region comprises a first device isolation region extending in a first direction and having a first air gap and a second device isolation region extending in a second direction crossing the first direction and having a second air gap and a conductive shield pillar, and
wherein each of the active region is defined by the first device isolation region and the second device isolation region.
16. The semiconductor device according to claim 15 , wherein the conductive shield pillar is electrically coupled to the semiconductor substrate.
17. The semiconductor device according to claim 15 , wherein the conductive shield pillar comprises polysilicon doped with boron.
18. The semiconductor device according to claim 15 , wherein each of the active region has a minor axis and a major axis,
wherein the first device isolation region is positioned between the minor axes of neighboring active regions, and
wherein the second device isolation region is positioned between the major axes of the neighboring active regions.
19. The semiconductor device according to claim 18 , wherein the conductive shield pillar and the second air gap are positioned between the major axes of neighboring active regions.
20. The semiconductor device according to claim 18 , the first air gap is positioned between minor axes of the neighboring active regions.