Granted Patent B2

US 9,431,581 · App. 14/869,625 · Granted Aug 30, 2016

Abstract

Claims (24)

1. A method comprising:

bonding a wafer of semiconductor light emitting devices, each semiconductor light emitting device comprising a light emitting layer sandwiched between an n-type region and a p-type region, to a wafer of support substrates, each support substrate comprising a body; and

after bonding the wafer of semiconductor light emitting devices to the wafer of support substrates, forming vias extending through the entire thickness of the body of each support substrate;

wherein said bonding comprises bonding at a temperature less than 300° C., and wherein the at least one bonding layer comprises a first dielectric bonding layer formed on the wafer of semiconductor light emitting devices and a second dielectric bonding layer formed on the wafer of support substrates.

2. The method of claim 1 wherein said bonding comprises bonding at a temperature between 230° C. and 275° C.

3. The method of claim 1 wherein said bonding comprises bonding at a temperature less than 150° C.

4. The method of claim 1 wherein said bonding comprises bonding at a temperature between 100° C. and 250° C.

5. The method of claim 1 further comprising thinning the body of each support substrate prior to said forming vias.

6. The method of claim 1 further comprising dicing the wafer of semiconductor light emitting devices into individual light emitting device chips after bonding the wafer of semiconductor light emitting devices to the wafer of support substrates.

7. The method of claim 1 wherein bonding the wafer of semiconductor light emitting devices to the wafer of support substrates comprises bonding via at least one bonding layer.

8. The method of claim 7 wherein the at least one bonding layer comprises regions of metal separated by regions of dielectric, wherein the regions of metal and regions of dielectric are formed on a top surface of the body of each support substrate.

9. The method of claim 7 wherein the at least one bonding layer comprises a polymer layer formed on the wafer of semiconductor light emitting devices.

10. The method of claim 7 wherein the at least one bonding layer comprises an organic adhesive formed on the wafer of semiconductor light emitting devices.

11. A method comprising:

in a first aligning procedure, aligning a wafer of semiconductor light emitting devices, each semiconductor light emitting device comprising a light emitting layer sandwiched between an n-type region and a p-type region, with a wafer of support substrates, each support substrate comprising a body;

bonding the wafer of semiconductor light emitting devices to the wafer of support substrates;

in a second aligning procedure, aligning an etch mask with metallizations formed on the wafer of semiconductor light emitting devices; and

after bonding the wafer of semiconductor light emitting devices to the wafer of support substrates, forming vias extending through an entire thickness of the body of each support substrate, wherein the vias are defined by the etch mask;

wherein the first aligning procedure is less precise than the second aligning procedure.

12. The method of claim 11 wherein the first aligning procedure comprises visual alignment.

13. The method of claim 11 wherein the second aligning procedure comprises one of IR alignment and backside alignment.

14. The method of claim 11 wherein at the time of bonding, the wafer of support substrates contains no features.

15. The method of claim 11 wherein said bonding comprises bonding via a bonding layer.

16. The method of claim 11 wherein said bonding comprises bonding at a temperature between 100° C. and 250° C.

Assignments (7)