IP Library Granted Patent US 10,168,394
Granted Patent B2
US 10,168,394 · App. 14/870,599 · Granted Jan 1, 2019

Method for manufacturing magnetism measurement device, method for manufacturing gas cell, magnetism measurement device, and gas cell

Inventors: Eiichi Fujii (Shiojiri, JP); Kimio Nagasaka (Hokuto, JP)
Assignee: SEIKO EPSON CORPORATION
G01R33/032G01R33/0052
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,168,394
App. No.
14/870,599
Granted
Jan 1, 2019
Kind
B2
Abstract

A method for manufacturing a magnetism measurement device which measures a magnetic field generated from a living body, includes: arranging an ampoule made of borosilicate glass and having a hollow part filled with a solid alkali metal, in a void in a cell section made of quartz glass, and then sealing the cell section; and casting a pulse laser beam on the ampoule through the cell section and thus forming a penetration hole in the ampoule. The pulse laser beam has an energy of 20 μJ/pulse to 200 μJ/pulse. The absorption coefficient of quarts glass for the pulse laser beam is lower than the absorption coefficient of borosilicate glass for the pulse laser beam.

Claims (42)

1. A method for manufacturing an atomic oscillator, the method comprising:

arranging, in a void in a cell section made of a first glass, an ampoule made of a second glass different from the first glass and having a hollow part filled with a material, and then sealing the cell section; and

casting pulse light on the ampoule through the cell section and thus forming a penetration hole in the ampoule,

wherein the pulse light has an energy of 20 μJ/pulse to less than 200 μJ/pulse, and

the first glass has a lower absorption coefficient for the pulse light than an absorption coefficient of the second glass for the pulse light.

2. The method according to claim 1 , wherein

the pulse light is a laser beam.

3. The method according to claim 1 , wherein

the pulse light is ultraviolet light.

4. The method according to claim 3 , wherein

the pulse light has a wavelength range of 248 nm to 355 nm.

5. The method according to claim 1 , wherein

the pulse light has a pulse width of nanoseconds.

6. The method according to claim 5 , wherein

the pulse width of pulse light is 10 nanoseconds to 50 nanoseconds.

7. The method according to claim 1 , wherein

the material is an alkali metal.

8. A method for manufacturing a gas cell, comprising:

arranging, in a void in a cell section made of a first glass, an ampoule made of a second glass different from the first glass and having a hollow part filled with a material, and then sealing the cell section; and

casting pulse light on the ampoule through the cell section and thus forming a penetration hole in the ampoule,

wherein the pulse light has an energy of 20 μJ/pulse to less than 200 μJ/pulse, and

the first glass has a lower absorption coefficient for the pulse light than an absorption coefficient of the second glass for the pulse light.

9. An atomic oscillator manufactured by the method according to claim 1 .

10. The method of claim 1 , wherein the second glass is borosilicate glass.

11. The method of claim 8 , wherein the second glass is borosilicate glass.

12. A method for manufacturing an atomic oscillator, the method comprising:

arranging, in a void in a cell section, an ampoule made of borosilicate glass and having a hollow part filled with a material, and then sealing the cell section, the cell section being made from a first glass different from borosilicate glass; and

casting pulse light on the ampoule through the cell section and thus forming a penetration hole in the ampoule,

wherein the pulse light has an energy of 20 mJ/pulse to 200 mJ/pulse, and

the first glass has a lower absorption coefficient for the pulse light than an absorption coefficient of the borosilicate glass for the pulse light.

13. The method according to claim 12 , wherein

the pulse light is a laser beam.

14. The method according to claim 12 , wherein

the pulse light is ultraviolet light.

15. The method according to claim 14 , wherein

the pulse light has a wavelength range of 248 nm to 355 nm.

16. The method according to claim 12 , wherein

the pulse light has a pulse width of nanoseconds.

17. The method according to claim 16 , wherein

the pulse width of pulse light is 10 nanoseconds to 50 nanoseconds.

18. The method according to claim 12 , wherein

the material is an alkali metal.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 30, 2015
From: FUJII, EIICHI; NAGASAKA, KIMIO
To: SEIKO EPSON CORPORATION
Reel/Frame 036693/0016 →
Priority Claims (1)
JP 2014-203700 · Oct 2, 2014 · national
Continuity (1)
Related Publication 20160097824A1 · Apr 7, 2016