MEMS grid for manipulating structural parameters of MEMS devices
A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.
1. A method of fabricating a MEMS device with controllable structural characteristics, comprising:
identifying structural requirements of one or more structures of a MEMS device;
determining a first geometric pattern;
determining a second geometric pattern; and
etching a plurality of holes into the MEMS device, wherein a first subset of the plurality of holes etched into the MEMS device corresponds to the first geometric pattern and a second subset of the plurality of holes etched into the MEMS device corresponds to the second geometric pattern.
2. The method of claim 1 , further comprising filling the first subset of the plurality of holes with an absorbent material.
3. The method of claim 1 , further comprising filling the second subset of the plurality of holes with an absorbent material.
4. The method of claim 1 , wherein the first geometric pattern comprises one or more of: squares; triangles; circles; honeycombs; rectangles; and slots.
5. The method of claim 1 , wherein the second geometric pattern comprises one or more of: squares; triangles; circles; honeycombs; rectangles; and slots.
6. The method of claim 1 , further comprising:
determining a third geometric pattern; and
wherein a third subset of the plurality of holes corresponds to the third geometric pattern.