Complementary SOI lateral bipolar transistors with backplate bias
View Patent ↗A complementary bipolar junction transistor (BJT) integrated structure and methods for fabricating and operating such. The structure includes a monolithic substrate and conductive first and second backplates electrically isolated from each other. An NPN lateral BJT is superposed over the first backplate, and a PNP lateral BJT is superposed over the second backplate. A buried oxide (BOX) layer is positioned between the NPN lateral BJT and the first backplate, and between the PNP lateral BJT and the second backplate.
1. A complementary bipolar junction transistor (BJT) integrated structure comprising:
a monolithic substrate;
an electrically conductive first backplate positioned over the monolithic substrate;
an electrically conductive second backplate positioned over the monolithic substrate, the first backplate and the second backplate being electrically isolated from each other;
an NPN lateral BJT superposing the first backplate, the NPN lateral BJT configured to conduct electricity horizontally between an NPN emitter and an NPN collector when the NPN lateral BJT is active;
a PNP lateral BJT superposing the second backplate, the PNP lateral BJT configured to conduct electricity horizontally between a PNP emitter and a PNP collector when the PNP lateral BJT is active; and
a first buried oxide (BOX) layer positioned between the NPN lateral BJT and the first backplate, and between the PNP lateral BJT and the second backplate.
2. The complementary BJT integrated structure of claim 1 , further comprising:
a first contact electrically coupled to the first backplate and extending vertically from the first backplate through the first BOX layer; and
a second contact electrically coupled to the second backplate and extending vertically from the second backplate through the first BOX layer.
3. The complementary BJT integrated structure of claim 1 , wherein top surfaces of the NPN emitter, the NPN collector, the PNP emitter and the PNP collector are on a same horizontal plane.
4. The complementary BJT integrated structure of claim 1 , wherein the first backplate is n+ doped and positioned under the NPN lateral BJT, and the second backplate is p+ doped and is positioned under the PNP lateral BJT.
5. The complementary BJT integrated structure of claim 1 , wherein the monolithic substrate is p doped.
6. The complementary BJT integrated structure of claim 1 , wherein the NPN lateral BJT and the PNP lateral BJT are heterojunction BJTs.
7. The complementary BJT integrated structure of claim 1 , further comprising:
a plurality of NPN lateral BJTs superposing the first backplate, the NPN lateral BJT being one of the plurality of NPN lateral BJTs; and
a plurality of PNP lateral BJTs superposing the second backplate, the PNP lateral BJT being one of the plurality of PNP lateral BJTs.
8. The complementary BJT integrated structure of claim 1 , wherein a second BOX layer is positioned between the first backplate and the monolithic substrate, and between the second backplate and the monolithic substrate, such that the first backplate and the second backplate are electrically isolated from the monolithic substrate.
9. The complementary BJT integrated structure of claim 1 , further comprising:
wherein the NPN lateral BJT includes an NPN base;
wherein the PNP lateral BJT includes a PNP base;
wherein the NPN base is electrically coupled to the PNP base; and
wherein the NPN collector is electrically coupled to the PNP collector.
10. The complementary BJT integrated structure of claim 1 , further comprising a shallow trench isolation (STI) between the NPN lateral BJT and the PNP lateral BJT.