Decorative HIPIMS hard material layers
A method for coating substrates with a decorative layer of hard material which is guided into a vacuum coating chamber. The decorative layer of hard material is deposited by a reactive HIPIMS-process, and the energy content in the power pulses is controlled in such a manner that the deposited layer of hard material has a homogeneous colour, a high degree of smoothness and a high strength.
1. A method for coating at least parts of a surface of a substrate or for manufacturing substrates with a part of the surface provided with a decorative hard material layer in a coating chamber, whereby a reactive HIPIMS-process is applied for manufacturing a hard-material layer, which makes use of reactive gases, an inert gas and of at least one target comprising titanium which reacts during operating the reactive HIPIMS-process with the reactive gases in such a manner, that, thereby, a predetermined layer color is produced, wherein the reactive HIPIMS-process is operated by applying:
power pulse-sequences with an energy content of at least 0.2 Joule/cm 2 with respect to a surface of the at least one target wherein each power pulse-sequence comprises a burst of pulses with a first time between each pulse, and each power-pulse sequence is separated from each other by a second time, wherein the second time is greater than the first time,
and adjusting power density per power pulse-sequence by adjusting a power of the burst of pulses of the power pulse-sequence, wherein the power of each pulse of the power pulse-sequence is held constant at a maximum value for a first predetermined period of time and is reduced to a reference value and held constant at the reference value for a second predetermined period of time before increasing to form another pulse,
wherein the adjusting power density per power pulse-sequence includes adjusting a duration of at least two of the pulses of the power pulse-sequence, while maximum values of the at least two of the pulses are held substantially equal; and
wherein for conducting the reactive HIPIMS-process applied for manufacturing the hard-material layer, the inert gas includes Ar, the reactive gases include N 2 and C 2 H 2 and are used for producing TiCN-layers, wherein a flow rate of Ar is 150 to 210 sccm, a flow rate of N 2 is 20 to 50 seem and a flow rate of C 2 H 2 is greater than 0 to less than or equal to 30 sccm, wherein the power pulse-sequences cause the coating to achieve a homogeneous color appearance.
2. The method of claim 1 wherein the energy content in the power pulse-sequences, with respect to the surface of the at least one target, is at least 1 Joule/cm 2 per power pulse-sequence.
3. The method of claim 1 wherein the power density is at least 100 W/cm 2 .
4. The method of claim 3 wherein the power density is at least 500 W/cm 2 .
5. The method of claim 4 wherein the power density is at least 1000 W/cm 2 .
6. The method according to claim 1 , wherein a temperature of the substrate is below 200° C. for coating temperature-sensitive substrates.
7. The method of claim 1 , wherein a concentration of nitrogen in the coating chamber is controlled by regulating the flow rate of N2, so of a nitrogen gas flow and the nitrogen gas flow is regulated so, that the homogenous color appearance accords with a color according to Gold 2N18 or 1N14 or 3N18.
8. Hard-material layer, manufactured by making use of a method according claim 1 , characterized by the fact, that the hard-material layer has a hardness of at least 30 GPa.
9. The method of claim 1 , wherein a height of the coating chamber is 400 mm or more.
10. The method of claim 1 , wherein the adjusting power density per power pulse-sequence causes an immediately subsequent cycle of a power pulse-sequence to have a different power density from an immediately preceding cycle of a power-pulse sequence, respectively.
11. The method of claim 1 , wherein the reference value is zero.
12. A method for coating at least parts of a surface of a substrate or for manufacturing substrates with a part of the surface provided with a decorative hard-material layer in a coating chamber, whereby a reactive HIPIMS-process is applied for manufacturing a hard-material layer, which makes use of reactive gases, an inert gas and of at least one target comprising titanium which reacts during operating the reactive HIPIMS-process with the reactive gases in such a manner, that, thereby, a predetermined layer color is produced, wherein the reactive HIPIMS-process is operated by applying:
power pulse-sequences with an energy content of at least 0.2 Joule/cm 2 with respect to a surface of the at least one target wherein each power pulse-sequence comprises a burst of pulses with a first time between each pulse, and each power-pulse sequence is separated from each other by a second time, wherein the second time is greater than the first time,
and adjusting power density per power pulse-sequence by adjusting a power of the burst of pulses of the power pulse-sequence, wherein the power of a first pulse of the power pulse-sequence is held constant at a first maximum value for a first predetermined period of time and is reduced to a reference value and held constant at the reference value for a second predetermined period of time before increasing to a second maximum value of a second pulse,
wherein the adjusting power density per power pulse-sequence includes adjusting the second maximum value to be greater than the first maximum value, while a duration of the second maximum value is substantially equal to a duration of the first maximum value; and
wherein for conducting the reactive HIPIMS-process applied for manufacturing the hard-material layer, the inert gas includes Ar, the reactive gases include N 2 and C 2 H 2 and are used for producing TiCN-layers, wherein a flow rate of Ar is 150 to 210 sccm, a flow rate of N 2 is 20 to 50 seem and a flow rate of C 2 H 2 is greater than 0 to less than or equal to 30 sccm, wherein the power pulse-sequences cause the coating to achieve a homogeneous color appearance.
13. The method of claim 12 wherein the energy content in the power pulse-sequences, with respect to the surface of the at least one target, is at least 1 Joule/cm 2 per power pulse-sequence.
14. The method of claim 12 wherein the power density is at least 100 W/cm 2 .
15. The method of claim 14 wherein the power density is at least 500 W/cm 2 .
16. The method of claim 15 wherein the power density is at least 1000 W/cm 2 .
17. The method according to claim 12 , wherein a temperature of the substrate is below 200° C. for coating temperature-sensitive substrates.
18. The method of claim 12 , wherein a concentration of nitrogen in the coating chamber is controlled by regulating the flow rate of N2, so, that the homogenous color appearance accords with a color according to Gold 2N18 or 1N14 or 3N18.
19. Hard-material layer, manufactured by making use of a method according claim 12 , characterized by the fact, that the hard-material layer has a hardness of at least 30 GPa.
20. The method of claim 12 , wherein a height of the coating chamber is 400 mm or more.
21. The method of claim 12 , wherein the adjusting power density per power pulse-sequence causes an immediately subsequent cycle of a power pulse-sequence to have a different power density from an immediately preceding cycle of a power-pulse sequence, respectively.
22. The method of claim 12 , wherein the reference value is zero.