Silica for CMP, aqueous dispersion, and process for producing silica for CMP
To reduce scratches during polishing while ensuring an appropriately high polishing rate, provided are a silica for CMP satisfying the following (A) to (C), an aqueous dispersion using a silica for CMP, and a method of producing a silica for CMP: (A) a BET specific surface area of 40 m 2 /g or more and 180 m 2 /g or less; (B) a particle density measured by a He-gas pycnometer method of 2.24 g/cm 3 or more; and (C) a coefficient of variation in primary particle diameter calculated by TEM/image analysis of 0.40 or less.
1. A silica for CMP, which satisfies the following (A) to (C):
(A) a BET specific surface area of 40 m 2 /g or more and 180 m 2 /g or less;
(B) a particle density measured by a He-gas pycnometer method of 2.24 g/cm 3 or more; and
(C) a coefficient of variation in primary particle diameter calculated by TEM/image analysis of 0.40 or less.
2. A silica for CMP according to claim 1 , wherein the silica for CMP has a fractal shape parameter αmax value within a particle diameter range of from 3 nm to 70 nm of 2.9 or more.
3. A silica for CMP according to claim 1 , wherein the silica for CMP has a content of Fe of 0.4 ppm or less in terms of Fe 2 O 3 .
4. A silica for CMP according to claim 1 , wherein the silica for CMP has a content of Al of 0.3 ppm or less in terms of Al 2 O 3 , a content of Ni of 0.1 ppm or less, a content of Cr of 0.1 ppm or less, a content of boron of 1.3 ppm or less, and a content of phosphorus of 0.5 ppm or less.
5. A silica for CMP according to claim 1 , wherein the particle density is 2.25 g/cm 3 or more.
6. A silica for CMP, comprising fumed silica produced by a flame hydrolysis reaction of a silane compound, wherein the silica satisfies the following (A) to (C):
(A) a BET specific surface area of 40 m 2 /g or more and 180 m 2 /g or less;
(B) a particle density measured by a He-gas pycnometer method of 2.24 g/cm 3 or more; and
(C) a coefficient of variation in primary particle diameter calculated by TEM/image analysis of 0.40 or less.
7. An aqueous dispersion, comprising a silica for CMP satisfying the following (A) to (C):
(A) a BET specific surface area of 40 m 2 /g or more and 180 m 2 /g or less;
(B) a particle density measured by a He-gas pycnometer method of 2.24 g/cm 3 or more; and
(C) a coefficient of variation in primary particle diameter calculated by TEM/image analysis of 0.40 or less.
8. A method of producing a silica for CMP by subjecting a silane compound to hydrolysis in flame formed in a reaction vessel,
the method comprising producing, under a production condition of an adiabatic flame temperature of 1,800° C. or more and a pressure in the reaction vessel of 10 kPaG or more, a silica for CMP satisfying the following (A) to (C):
(A) a BET specific surface area of 40 m 2 /g or more and 180 m 2 /g or less;
(B) a particle density measured by a He-gas pycnometer method of 2.24 g/cm 3 or more; and
(C) a coefficient of variation in primary particle diameter calculated by TEM/image analysis of 0.40 or less.
9. A method of producing a silica for CMP according to claim 8 ,
wherein the flame is formed by a multi-tube burner,
wherein the silane compound is supplied to the flame by being supplied to a center tube of the multi-tube burner, and
wherein a gas flow rate in the center tube of the multi-tube burner is from 50 m/sec to 100 m/sec in terms of a standard state.