Method of separating light emitting devices formed on a substrate wafer
View Patent ↗A method according to embodiments of the invention includes growing on a first surface of a sapphire substrate a semiconductor structure including a light emitting layer disposed between an n-type region and a p-type region. The semiconductor structure is formed into a plurality of LEDs. Cracks are formed in the sapphire substrate. The cracks extend from the first surface of the sapphire substrate and do not penetrate an entire thickness of the sapphire substrate. After forming cracks in the sapphire substrate, the sapphire substrate is thinned from a second surface of the sapphire substrate. The second surface is opposite the first surface.
1. A method comprising:
growing on a first surface of a sapphire substrate a semiconductor structure comprising a light emitting layer disposed between an n-type region and a p-type region;
forming the semiconductor structure into LEDs;
thinning the sapphire substrate from a second surface of the sapphire substrate in a first thinning process, the second surface being opposite the first surface;
after thinning the sapphire substrate from the second surface in the first thinning process, forming cracks in the sapphire substrate, the cracks extending from the first surface of the sapphire substrate into the substrate without penetrating an entire thickness of the sapphire substrate; and
after forming cracks in the sapphire substrate, thinning the sapphire substrate from the second surface of the sapphire substrate in a second thinning process.
2. The method of claim 1 , wherein forming the cracks comprises laser scribing.
3. The method of claim 1 , wherein forming the cracks comprises mechanically scribing.
4. The method of claim 1 , wherein forming the cracks comprises laser scribing the cracks from the second surface.
5. The method of claim 1 , wherein thinning the sapphire substrate from the second surface of the sapphire substrate in the second thinning process comprises thinning the sapphire substrate to expose the cracks.
6. The method of claim 1 , wherein the cracks are formed between individual LEDs.
7. The method of claim 1 , wherein the cracks are formed between groups of LEDs.
8. The method of claim 1 , wherein the cracks are between 30 μm and 100 μm deep.
9. The method of claim 1 , wherein the substrate is no more than 300 thick after the substrate is thinned in the first thinning process.
10. The method of claim 1 , further comprising separating at least some of the LEDs from one another.
11. A method comprising:
at least partially forming a plurality of light-emitting semiconductor devices on a first surface of a substrate, each of the semiconductor devices including a respective active layer situated between a respective n-type layer and a respective p-type layer;
thinning the substrate from a second surface of the substrate in a first thinning process, the second surface being opposite the first surface;
after thinning the substrate from the second surface in the first thinning process, forming cracks in the substrate, the cracks extending from the first surface of the substrate into the substrate without penetrating an entire thickness of the substrate;
after forming cracks in the substrate, thinning the substrate from the second surface of the substrate in a second thinning process; and
separating at least some of the semiconductor devices from one another.
12. The method of claim 11 , wherein the cracks are formed by laser scribing.
13. The method of claim 11 , wherein forming the cracks comprises at least one of mechanically scribing and laser scribing.
14. The method of claim 11 , wherein thinning the substrate from the second surface of the substrate in the second thinning process comprises thinning the substrate to expose the cracks.