Photosensitive resin composition for projection exposure, photosensitive element, method for forming resist pattern, process for producing printed wiring board and process for producing lead frame
View Patent ↗An object of the present invention is to provide a photosensitive resin composition for projection exposure capable of forming a resist pattern that is excellent in adhesion, resolution, and inhibitory properties against the occurrence of resist footing, and the present invention provides a photosensitive resin composition for projection exposure comprising (A) a binder polymer; (B) a photopolymerizable compound having an ethylenically unsaturated bond; (C) a photopolymerization initiator; and (D) a sensitizing dye, wherein the (B) photopolymerizable compound having an ethylenically unsaturated bond comprises a (meth)acrylate compound having a skeleton derived from dipentaerythritol and a compound represented by the following formula (III): wherein R 8 , R 9 , R 10 , and R 11 each independently represent a hydrogen atom or a methyl group, X and Y each independently represent an ethylene group or a propylene group, p 1 , p 2 , q 1 , and q 2 each independently represent a numerical value of 0 to 9, both p 1 +q 1 and p 2 +q 2 are 1 or more, and p 1 +q 1 +p 2 +q 2 is 2 to 9.
1. A photosensitive resin composition for projection exposure, comprising:
(A) a binder polymer;
(B) a photopolymerizable compound having an ethylenically unsaturated bond;
(C) a photopolymerization initiator; and
(D) a sensitizing dye not including a pyrazoline,
wherein the (B) photopolymerizable compound having an ethylenically unsaturated bond comprises a (meth)acrylate compound having a skeleton derived from dipentaerythritol and a compound represented by the following formula (III):
wherein R 8 , R 9 , R 10 , and R 11 each independently represent a hydrogen atom or a methyl group, X and Y each independently represent an ethylene group or a propylene group, p 1 , p 2 , q 1 , and q 2 each independently represent a numerical value of 0 to 9, both p 1 +q 1 and p 2 +q 2 are 1 or more, and p 1 +q 1 +p 2 +q 2 is 2 to 9.
2. The photosensitive resin composition for projection exposure according to claim 1 , wherein the (meth)acrylate compound having a skeleton derived from dipentaerythritol has an ethylene oxide chain.
3. A method for forming a resist pattern, comprising:
a photosensitive resin layer forming step of forming a photosensitive resin layer on a substrate using the photosensitive resin composition for projection exposure according to claim 1 ;
an exposure step of exposing at least a part of the photosensitive resin layer to active light projecting an image of a photomask via a lens to photocure an exposed portion; and
a development step of removing an uncured portion of the photosensitive resin layer from the substrate by development.
4. A photosensitive element comprising:
a support; and
a photosensitive resin layer formed on the support using the photosensitive resin composition for projection exposure according to claim 1 .
5. A process for producing a printed wiring board, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 3 ; and
a step of forming a conductor pattern by etching portions of the conductor layer not covered by photosensitive resin of the resist pattern or by plating portions of the conductor layer not covered by photosensitive resin of the resist pattern.
6. A process for producing a lead frame, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 3 ; and
a step of forming a conductor pattern by plating portions of the conductor layer not covered by photosensitive resin of the resist pattern.
7. A method for forming a resist pattern, comprising:
a photosensitive resin layer forming step of forming a photosensitive resin layer on a substrate using the photosensitive resin composition for projection exposure according to claim 2 ; an exposure step of exposing at least a part of the photosensitive resin layer to active light projecting an image of a photomask via a lens to photocure an exposed portion; and
a development step of removing an uncured portion of the photosensitive resin layer from the substrate by development.
8. A photosensitive element comprising:
a support; and
a photosensitive resin layer formed on the support using the photosensitive resin composition for projection exposure according to claim 2 .
9. A process for producing a printed wiring board, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 7 ; and
a step of forming a conductor pattern by etching portions of the conductor layer not covered by photosensitive resin of the resist pattern or plating portions of the conductor layer not covered by photosensitive resin of the resist pattern.
10. A process for producing a lead frame, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 7 ; and
a step of forming a conductor pattern by plating portions of the conductor layer not covered by photosensitive resin of the resist pattern.
11. A process for producing a printed wiring board, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 7 ; and
a step of forming a conductor pattern by etching portions of the conductor layer not covered by photosensitive resin of the resist pattern.
12. A process for producing a printed wiring board, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 3 ; and
a step of forming a conductor pattern by etching portions of the conductor layer not covered by photosensitive resin of the resist pattern.
13. A process for producing a printed wiring board, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 3 ; and
a step of forming a conductor pattern by plating portions of the conductor layer not covered by photosensitive resin of the resist pattern, then removing the resist pattern and etching the conductor layer that had been covered by the resist pattern.
14. A process for producing a printed wiring board, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 7 ; and
a step of forming a conductor pattern by plating portions of the conductor layer not covered by photosensitive resin of the resist pattern, then removing the resist pattern and etching the conductor layer that had been covered by the resist pattern.
15. A process for producing a lead frame, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 3 ; and
a step of forming a conductor pattern by plating portions of the conductor layer not covered by photosensitive resin of the resist pattern, then removing the resist pattern and etching the conductor layer that had been covered by the resist pattern.
16. A process for producing a lead frame, comprising:
a step of forming a resist pattern on a substrate including a conductor layer by the method for forming a resist pattern according to claim 7 ; and
a step of forming a conductor pattern by plating portions of the conductor layer not covered by photosensitive resin of the resist pattern, then removing the resist pattern and etching the conductor layer that had been covered by the resist pattern.