Pixel defining layer and manufacturing method thereof, display panel and display device
The present invention discloses a pixel defining layer and a manufacturing method thereof, a display panel and a display device. The pixel defining layer comprises a first pixel defining layer and a second pixel defining layer stacked on the first pixel defining layer, wherein the first pixel defining layer has a plurality of first openings corresponding to light-emitting regions of respective sub-pixels in one-to-one correspondence, the second pixel defining layer has a plurality of second openings corresponding to the first openings in one-to-one correspondence, a cross section of the first opening is in a regular trapezoidal shape which is narrow at top and wide at bottom, and a cross section of the second opening is in an inverted trapezoidal shape which is wide at top and narrow at bottom. The present invention can effectively avoid the short between the anode and the cathode and the open of the cathode.
1. A pixel defining layer comprising a first pixel defining layer and a second pixel defining layer stacked on the first pixel defining layer, wherein the first pixel defining layer has a plurality of first openings corresponding to light-emitting regions of respective sub-pixels in one-to-one correspondence, the second pixel defining layer has a plurality of second openings corresponding to the plurality of first openings in one-to-one correspondence, a cross section of the first opening is in a regular trapezoidal shape which is narrow at top and wide at bottom, and a cross section of the second opening is in an inverted trapezoidal shape which is wide at top and narrow at bottom;
wherein the first pixel defining layer is a hydrophilic film layer, and the second pixel defining layer is a hydrophobic film layer; and
wherein the hydrophilic film layer is a negative photoresist film layer, and the hydrophobic film layer is a positive photoresist film layer.
2. The pixel defining layer of claim 1 , wherein a thickness of the first pixel defining layer is smaller than that of the second pixel defining layer.
3. The pixel defining layer of claim 2 , wherein the thickness of the first pixel defining layer is between 2000 Ř5000 Å, and the thickness of the second pixel defining layer is between 5000 Ř15000 Å.
4. A display panel comprising the pixel defining layer of claim 1 formed on a substrate.
5. The display panel of claim 4 , wherein the plurality of first openings of the first pixel defining layer are formed therein with anode layers and organic light-emitting layers of respective sub-pixels, the organic light-emitting layer is on the anode layer, and a sum of thicknesses of the organic light-emitting layer and the anode layer is identical to or larger than the thickness of the first pixel defining layer.
6. The display panel of claim 5 , wherein the plurality of second openings of the second pixel defining layer are formed therein with cathode layers of respective sub-pixels, and the cathode layer is on the organic light-emitting layer.
7. A display device comprising the display panel of claim 4 .
8. A display device comprising the display panel of claim 5 .
9. A display device comprising the display panel of claim 6 .
10. A manufacturing method of a pixel defining layer comprising:
forming a hydrophilic film layer on a substrate, and patterning the hydrophilic film layer to form a first pixel defining layer having a plurality of first openings corresponding to light-emitting regions of respective sub-pixels in one-to-one correspondence; and
forming a hydrophobic film layer on the substrate formed with the first pixel defining layer thereon, and patterning the hydrophobic film layer to form a second pixel defining layer having a plurality of second openings corresponding to the plurality of first openings in one-to-one correspondence;
wherein the hydrophilic film layer is a negative photoresist film layer, and the hydrophobic film layer is a positive photoresist film layer.
11. The manufacturing method of claim 10 , wherein the step of forming a hydrophilic film layer on a substrate, and patterning the hydrophilic film layer to form a first pixel defining layer having a plurality of first openings corresponding to light-emitting regions of respective sub-pixels in one-to-one correspondence comprises:
forming the negative photoresist film with a first predetermined thickness on the substrate by using a spin coating method or a drop coating method; and
exposing and developing the negative photoresist film to form the plurality of first openings corresponding to light-emitting regions of respective sub-pixels in one-to-one correspondence.
12. The manufacturing method of claim 10 , wherein the step of forming a hydrophobic film layer on the substrate formed with the first pixel defining layer thereon, and patterning the hydrophobic film layer to form a second pixel defining layer having a plurality of second openings corresponding to the plurality of first openings in one-to-one correspondence comprises:
forming the positive photoresist film with a second predetermined thickness on the substrate formed with the first pixel defining layer thereon by using a spin coating method or a drop coating method; and
exposing and developing the positive photoresist film to form the plurality of second openings corresponding to the plurality of first openings in one-to-one correspondence.