Polymer and composition containing same
The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.
1. A polymer represented by Chemical Formula 1 or 2 below:
wherein
A and B are each independently selected from (C6-C20)arylene and (C3-C20)heteroarylene;
C is
wherein R 11 , R 12 , and R 13 are independently selected from hydrogen, halogen, hydroxy and (C1-C20)alkyl;
A and B may be further be independently substituted with hydroxy, halogen, (C1-C20)alkyl, (C1-C20)alkoxy, (C3-C20)cycloalkyl, (C6-C20)aryl and (C3-C20)heteroaryl;
p and q are independently selected integers from 0 to 5, wherein p+q>0;
r is an integer from 1 to 5; and
m and n are each an independent integer from 1 to 1000.
2. The polymer of claim 1 , wherein the Chemical Formula 1 is represented by Chemical Formulas 3 or 4 below:
3. The polymer of claim 2 , wherein A and B are each independently selected from the following Structural Formulas 6-16:
wherein, R 1 to R 4 are independently selected from hydrogen, halogen, hydroxy, (C1-C20)alkyl and (C6-C20)aryl.
4. The polymer of claim 1 , wherein A and B are each independently selected from the following Structural Formulas 6-16:
wherein,
R 1 to R 4 are independently selected from hydrogen, halogen, hydroxy, (C1-C20)alkyl and (C6-C20)aryl.
5. The polymer of claim 1 , wherein
A is
,and
B is
6. A composition comprising a polymer represented by Chemical Formula 1 or 2 below:
wherein
A and B are each independently selected from (C6-C20)arylene and (C3-C20)heteroarylene;
C is
wherein R 11 , R 12 , and R 13 are independently selected from hydrogen, halogen, hydroxy and (C1-C20)alkyl;
A and B may be further be independently substituted with hydroxy, halogen, (C1-C20)alkyl, (C1-C20)alkoxy, (C3-C20)cycloalkyl, (C6-C20)aryl and (C3-C20)heteroaryl;
p and q are independently selected integers from 0 to 5, wherein p+q>0;
r is an integer from 1 to 5; and
m and n are each an independent integer from 1 to 1000.
7. The composition of claim 6 , further comprising: a crosslinking agent and an acid catalyst.
8. The composition of claim 7 , wherein the composition includes 1 to 40 wt % of the polymer, 0.1 to 40 wt % of the crosslinking agent, 0.001 to 10 wt % of the acid catalyst, and residual amount of a solvent.
9. The composition of claim 7 , wherein the crosslinking agent is at least one selected from the group consisting of a melamine resin, an amino resin, a glycoluril compound and a bisepoxy compound.
10. The composition of claim 7 , wherein the acid catalyst is at least one selected from the group consisting of p-toluenesulfonic acid mono hydrate, pyridinium p-toluenesulfonic acid, p-toluenesulfonic acid amine salts including p-toluenesulfonic acid triethylamine salt, 2,4,4,6-tetrabromocyclohexadienone, benzoin tosylate, and 2-nitrobenzyl tosylate.
11. The composition of claim 6 , wherein the composition is used for a gap-fill process, a double patterning process, or a hard mask.