Pattern forming method using resist underlayer film
A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a fourth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.
1. A pattern forming method comprising:
a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film;
a second step of forming a resist pattern on the resist underlayer film;
a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and
a fourth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.
2. The pattern forming method according to claim 1 , wherein the polymer further has a protected carboxyl group.
3. The pattern forming method according to claim 1 , wherein the polymer further has an absorption moiety exhibiting absorption at a wavelength of 193 nm or an absorption moiety exhibiting absorption at a wavelength of 248 nm.
4. The pattern forming method according to claim 1 , wherein the resist underlayer film-forming composition further contains one or two or more of polymers selected from the group consisting of a polymer having a protected carboxyl group, a polymer having an absorption moiety exhibiting absorption at a wavelength of 193 nm, and a polymer having an absorption moiety exhibiting absorption at a wavelength of 248 nm.
5. The pattern forming method according to claim 1 , wherein the resist underlayer film-forming composition further contains as a crosslinker, a compound having one or two or more groups selected from the group consisting of an epoxy group, an oxetanyl group, a carboxyl group, a thiol group, and a phenyl group.
6. The pattern forming method according to claim 1 , wherein the inorganic film includes one or two or more selected from the group consisting of a polysilicon film, a silicon oxide film, a silicon nitride film, a BPSG film, a titanium nitride film, a titanium oxynitride film, a tungsten film, a gallium nitride film, and a gallium arsenide film.
7. The pattern forming method according to claim 1 , wherein the basic aqueous hydrogen peroxide solution contains ammonia, sodium hydroxide, potassium hydroxide, sodium cyanide, potassium cyanide, triethanolamine, or urea.
8. The pattern forming method according to claim 1 , wherein the basic aqueous hydrogen peroxide solution is a mixture of 25% by mass to 30% by mass of aqueous ammonia solution (A), 30% by mass to 36% by mass of aqueous hydrogen peroxide solution (B), and water (C), and the volume ratio (B)/(A) of the aqueous hydrogen peroxide solution (B) to the aqueous ammonia solution (A) is 0.1 to 20.0, and the volume ratio (C)/(A) of water (C) to the aqueous ammonia solution (A) is 5.0 to 50.0.