Semiconductor device including memory cell with transistors disposed in different active regions
A semiconductor device having an SRAM which includes: a monolithic first active region in which a first transistor and a fifth transistor are disposed; a second active region separated from the first active region, in which a second transistor is disposed; a monolithic third active region in which a third transistor and a sixth transistor are disposed; and a fourth active region separated from the third active region, in which a fourth transistor is disposed. Each driver transistor is divided into a first transistor and a second transistor (or a third transistor and a fourth transistor) and these driver transistors are disposed over different active regions.
1. A semiconductor device comprising:
a memory cell, including:
a first MIS transistor, coupled between a first voltage and a first node, having a first conductivity type,
a second MIS transistor, coupled between the first node and a second voltage different from the first voltage, having a second conductivity type,
a third MIS transistor, coupled between the first voltage and a second node, having the first conductivity type,
a fourth MIS transistor, coupled between the second node and the second voltage, having the second conductivity type,
a fifth MIS transistor, coupled between the first node and a first bit line, having the second conductivity type, and
a sixth MIS transistor, coupled between the second node and a second bit line, having the second conductivity type;
a semiconductor substrate, including:
a monolithic first active region in which the second MIS transistor and the fifth MIS transistor are disposed,
a monolithic second active region in which the fourth MIS transistor and the sixth MIS transistor are disposed,
a third active region in which the first MIS transistor is disposed, and
a fourth active region in which the third MIS transistor is disposed, the first, second, third and fourth active regions being arranged side by side in a first direction and spaced from each other;
a first gate wiring extending in the first direction over the first and third active regions;
a second gate wiring extending in the first direction over the second and fourth active regions; and
a plurality of wiring layers, including:
a first wiring layer which is coupled to another wiring layer through a plug including a word line, and
a second wiring layer which is formed between the semiconductor substrate and the first wiring layer including the first voltage line.
2. The semiconductor device according to claim 1 , wherein the plurality of wiring layers further includes:
an additional wiring layer, different from the first wiring layer, which includes the second voltage line.
3. A semiconductor chip comprising the semiconductor device according to claim 1 and a CPU.