An electronic support structure comprising one or more layers of copper features such as copper routing layers, laminated within a dielectric material comprising continuous glass fibers in a polymer matrix wherein pairs of adjacent layers of copper features are coupled by a via layer, and where terminations on at least one side of the electronic support structure comprise a modified bond-on-trace attachment sites comprising selectively exposed top and partial side surfaces of copper features in an outer layer of copper features for conductive coupling solder.
1. An electronic support structure comprising an underlying structure, the underlying structure comprising copper feature layers coupled together by perpendicular copper vias, the copper features and vias being embedded in a dielectric material having a polymer matrix and having an outer via layer conductively coupled to a surface routing layer, an inner part of the surface routing layer embedded within the dielectric material and an outer part of the surface routing layer of copper features protruding beyond the dielectric material.
2. The electronic support structure of claim 1 wherein the outer part of the layer of copper features protruding beyond the dielectric material is coated with Organic Solderability Preservative OSP.
3. The electronic support structure of claim 1 wherein the outer part of the layer of copper features protruding beyond the dielectric material protrude at least 5 microns beyond the dielectric material.
4. The electronic support structure of claim 1 wherein the layer of copper features is partially embedded in the dielectric material to a depth of at least 5 microns.
5. The electronic support structure of claim 1 wherein the dielectric material comprises a polymer matrix.
6. The electronic support structure of claim 1 wherein the polymer matrix comprises a polymer resin selected from the group of thermosets and thermoplastics.
7. The electronic support structure of claim 5 wherein the dielectric material further comprises glass fibers.
8. The electronic support structure of claim 5 wherein the dielectric material further comprises inorganic fillers.
9. The electronic support structure of claim 1 where terminations on at least one side of the electronic support structure comprise modified bond-on-trace attachment sites comprising selectively exposed top and partial side surfaces of copper features in an outer layer of copper features as sites for conductive coupling using solder.
10. The electronic support structure of claim 1 wherein side surfaces of the outer part of the outer copper feature protrude from the dielectric material by at least 5 microns for wetting by solder to facilitate attachment of an IC chip.
11. The electronic support structure of claim 1 comprising an interposer.
12. The electronic support structure of claim 1 wherein the underlying structure comprises a layer of terminations.
13. The electronic support structure of claim 1 wherein the underlying structure comprises at least one additional feature layer.
14. The electronic support structure of claim 13 wherein the underlying structure comprises at least one additional via layer.
15. A method of attaching an IC chip to an electronic support structure of claim 1 comprising selectively removing Organic Solderability Preservative OSP if present, and coupling the chip by flip chip technology directly to the outer part of the outer layer of features, such that solder from the chip terminations engages the top and part of the exposed side surfaces of the outer part of the outer layer of features, enabling strong anchoring.
16. The method of claim 15 , wherein the outer part of the outer layer of features is exposed by selective plasma ablation of the dielectric matrix.
17. An electronic support structure comprising an underlying structure comprising copper feature layers coupled together by perpendicular copper vias, the copper features and vias being embedded in a dielectric material having a polymer matrix and having an outer via layer conductively coupled to a surface routing layer which extends in a plane perpendicular to the vias, the copper features and vias being embedded in a dielectric material having a polymer matrix, an inner part of the surface routing layer embedded within the dielectric material and an outer part of the surface routing protruding beyond the dielectric material and wherein the outer part of the surface routing layer is coated with Organic Solderability Preservative OSP.
18. An electronic support structure comprising an underlying structure comprising copper feature layers coupled together by perpendicular copper vias, the copper features and vias being embedded in a dielectric material having a polymer matrix and having an outer via layer conductively coupled to a surface routing layer which extends in a plane perpendicular to the vias, the copper features and vias being embedded in a dielectric material having a polymer matrix wherein an inner part of the surface routing layer of copper features is embedded within the dielectric material and an outer part of the surface routing layer of copper features protrudes beyond the dielectric material, wherein at least one of the following limitations is true:
(i) terminations on at least one side of the electronic support structure comprise modified bond-on-trace attachment sites comprising selectively exposed top and partial side surfaces of copper features in an outer layer of copper features as sites for conductive coupling using solder;
(ii) side surfaces of the outer part of the outer copper feature protrude from the dielectric material by at least 5 microns for wetting by solder to facilitate attachment of an IC chip.