IP Library Granted Patent US 9,667,223
Granted Patent B1
US 9,667,223 · App. 14/940,069 · Granted May 30, 2017

Resonator electrode shields

Inventors: David Raymond Pedersen (Mountain View, CA); Aaron Partridge (Cupertino, CA); Thor Juneau (Menlo Park, CA)
Assignee: SiTime Corporation
H03H9/2405H03H3/0072
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Quick Facts
Patent No.
US 9,667,223
App. No.
14/940,069
Granted
May 30, 2017
Kind
B1
Abstract

A microelectromechanical system (MEMS) resonator includes a resonant semiconductor structure, drive electrode, sense electrode and electrically conductive shielding structure. The first drive electrode generates a time-varying electrostatic force that causes the resonant semiconductor structure to resonate mechanically, and the first sense electrode generates a timing signal in response to the mechanical resonance of the resonant semiconductor structure. The electrically conductive shielding structure is disposed between the first drive electrode and the first sense electrode to shield the first sense electrode from electric field lines emanating from the first drive electrode.

Claims (31)

1. A microelectromechanical system (MEMS) resonator comprising:

a resonant semiconductor structure;

a first drive electrode to generate a time-varying electrostatic force that causes the resonant semiconductor structure to resonate mechanically;

a first sense electrode to generate a timing signal in response to the mechanical resonance of the resonant semiconductor structure; and

a first electrically conductive shielding structure disposed between the first drive electrode and the first sense electrode to shield the first sense electrode from electric field lines emanating from the first drive electrode.

2. The MEMS resonator of claim 1 wherein the electrically conductive shielding structure comprises doped silicon.

3. The MEMS resonator of claim 1 further comprising a semiconductor substrate and a support element that secures the resonant semiconductor structure to the semiconductor substrate.

4. The MEMS resonator of claim 3 wherein the support element comprises at least one of an isolation structure, a flexure, or an anchor.

5. The MEMS resonator of claim 3 further comprising a second electrically conductive shielding structure disposed between the first sense electrode and the support element.

6. The MEMS resonator of claim 3 further comprising a second electrically conductive shielding structure disposed between the first drive electrode and the support element.

7. The MEMS resonator of claim 1 wherein the first electrically conductive shielding structure is coupled to a DC reference voltage node.

8. The MEMS resonator of claim 1 further comprising:

a second drive electrode that cooperates with the first drive electrode to differentially generate the time-varying electrostatic force; and

a second sense electrode that cooperates with the first sense electrode to differentially generate the timing signal.

9. The MEMS resonator of claim 8 further wherein the first electrically conductive shielding structure is disposed between the second drive electrode and the second sense electrode.

10. The MEMS resonator of claim 8 wherein the resonant semiconductor structure comprises a first resonant member disposed between the first and second drive electrodes and a second resonant member disposed between the first and second sense electrodes.

11. The MEMS resonator of claim 1 wherein the resonant semiconductor structure is disposed between the first drive electrode and the first sense electrode.

12. A method of operation within a microelectromechanical system (MEMS) resonator having a resonant semiconductor structure, the method comprising:

generating a time-varying electrostatic force at a first drive electrode to cause the resonant semiconductor structure to resonate mechanically;

generating a timing signal within a first sense electrode in response to the mechanical resonance of the resonant semiconductor structure; and

shielding the first sense electrode from electric field lines emanating from the first drive electrode via a conductive shielding structure disposed between the first drive electrode and the first sense electrode.

13. The method of claim 12 wherein shielding the first sense electrode from the electric field lines via the conductive shielding structure comprises conducting, to a DC reference voltage node, a current induced within the first shielding structure by the electric field lines.

14. The method of claim 12 wherein the wherein the electrically conductive shielding structure comprises doped silicon.

15. A method of fabricating a microelectromechanical system (MEMS) resonator, the method comprising:

forming a resonant semiconductor structure, a first drive electrode adjacent the resonant semiconductor structure, and a first sense electrode adjacent the resonant semiconductor structure; and

disposing a first electrically conductive shielding structure between the first drive electrode and the first sense electrode to shield the first sense electrode from electric field lines emanating from the first drive electrode during operation of the MEMS resonator.

16. The method of claim 15 wherein forming the resonant semiconductor structure comprises forming the resonant semiconductor structure from a semiconductor substrate, the method further comprising forming a support element that secures the resonant semiconductor structure to the semiconductor substrate.

17. The method of claim 15 wherein forming the support element comprises forming at least one of an isolation structure, a flexure, or an anchor from the semiconductor substrate.

18. The method of claim 16 further comprising disposing a second electrically conductive shielding structure between the first sense electrode and the support element.

19. The method of claim 16 further comprising disposing a second electrically conductive shielding structure between the first drive electrode and the support element.

20. The method of claim 15 wherein forming the resonant semiconductor structure comprises forming the resonant semiconductor structure from a first region of a semiconductor substrate and wherein disposing the first electrically conductive shielding structure between the first drive electrode and the first sense electrode comprises: forming a shielding member from a second region of the semiconductor substrate; and doping the shielding member to render the shielding member electrically conductive.

Assignments (3)
SECURITY INTEREST Recorded Jun 30, 2026
From: SITIME CORPORATION
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 075862/0712 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2016
From: PEDERSEN, DAVID RAYMOND; PARTRIDGE, AARON; JUNEAU, THOR
To: SITIME CORPORATION
Reel/Frame 037624/0991 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 10, 2015
From: PEDERSEN, DAVID RAYMOND; PARTRIDGE, AARON; JUNEAU, THOR
To: SITIME CORPORATION
Reel/Frame 037264/0431 →
Continuity (5)
Division 14300114 · Jun 9, 2014
Division 13561862 · Jul 30, 2012
Division 12897361 · Oct 4, 2010
Division 12054300 · Mar 24, 2008
Provisional Application 60970233 · Sep 5, 2007