Defect detection method and defect detection device and defect observation device provided with same
View Patent ↗The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.
1. An optics architecture for unpattern wafer inspection comprising:
an illumination system which outputs a laser, wherein the wave length of the laser is equal or less than 400 nm;
a refractive collector which accumulates light and directs the accumulated light toward an outside of the refractive collector;
an optical element which segments the accumulated light on the basis of a Numerical aperture, and outputs a first portion of light segmented by the optical element based on the Numerical aperture;
a polarization controller which segments the first portion on the basis of polarization, and outputs a second portion of light segmented by the polarization controller;
a first lens which accumulates at least one portion of the second portion, and forms an image; and
a line sensor which detects the image.
2. The optics architecture according to claim 1 , further comprising
a reflection optical element,
wherein the refractive collector includes a second lens and an objective lens;
wherein the reflection optical element is arranged between the second lens and the objective lens;
wherein the illumination system outputs illumination light from a gap between the second lens and objective lens to the reflection optical element; and
wherein the reflection optical element reflects the illumination light to the sample via the objective lens.
3. The optics architecture according to claim 2 ,
wherein the illumination system supplies the laser obliquely relative to the sample.
4. The optics architecture according to claim 3 ,
wherein the Numerical aperture to be segmented by the optical element includes a plurality of circular areas.
5. The optics architecture according to claim 3 ,
wherein the Numerical aperture to be segmented by the optical element includes a first type segment, and a plurality of second type segments.
6. The optics architecture according to claim 3 ,
wherein the first portion includes a first segment having a first polarization and a second segment having a second polarization different from the first polarization.
7. The optics architecture according to claim 1 ,
wherein the illumination system supplies the laser obliquely relative to the sample.
8. The optics architecture according to claim 1 ,
wherein the Numerical aperture to be segmented by the optical element includes a plurality of circular areas.
9. The optics architecture according to claim 1 ,
wherein the Numerical aperture to be segmented by the optical element includes a first type segment, and a plurality of second type segments.
10. The optics architecture according to claim 1 ,
wherein the first portion includes a first segment having a first polarization and a second segment having a second polarization different from the first polarization.