Image measuring apparatus and measuring apparatus
An image measuring apparatus includes a sample stage having a placement surface on which an object to be measured is placed; an image capture apparatus facing the placement surface of the sample stage and capturing an image of the object to be measured; and a pattern projection apparatus projecting a predetermined pattern onto the sample stage, the predetermined pattern providing a reference for at least one of a placement position and direction of the object to be measured on the placement surface.
1. An image measuring apparatus comprising:
a sample stage having a placement surface on which an object to be measured is to be placed;
an imager facing the placement surface of the sample stage and configured to capture an image of the object to be measured;
a pattern projector configured to project a predetermined pattern onto the sample stage, the predetermined pattern providing a reference for at least one of a placement position and a direction of the object to be measured on the placement surface, wherein the pattern projector comprises:
a mask configured to display the predetermined pattern, the mask including a shield and a transparent section;
a light source configured to emit light onto the mask such that the emitted light does not pass through the shield, and such that that the emitted light can pass through the transparent section; and
a projection optical system configured to project the emitted light through the mask onto the sample stage; and
an adjuster that provides for the adjustment of at least one of the color and intensity of the light projected from the pattern projector, according to reflectance of the measured object.
2. The image measuring apparatus according to claim 1 , wherein the pattern projector further comprises a keystone corrector configured to perform keystone correction of the predetermined pattern projected onto the placement surface.
3. The image measuring apparatus according to claim 1 , wherein the mask is positioned so as to be generally parallel to the placement surface.
4. The image measuring apparatus according to claim 1 , wherein:
an image capture direction of the imager is generally perpendicular with respect to the placement surface of the sample stage, and
the pattern projector is positioned on the same side of the sample stage as the placement surface and is configured to project the predetermined pattern onto the sample stage from a direction other than the image capture direction of the imager.
5. The image measuring apparatus according to claim 1 , wherein:
an image capture direction of the imager is generally perpendicular with respect to the placement surface of the sample stage, and
the pattern projector is positioned on the same side of the sample stage as the placement surface and is configured to project the predetermined pattern from generally the same direction as the image capture direction of the imager.
6. The image measuring apparatus according to claim 1 , wherein the pattern projector is positioned on an opposite side of the sample stage from the placement surface side, and is configured to project the predetermined pattern onto the sample stage from an opposite side surface of the sample stage.
7. A measuring apparatus comprising:
a sample stage having a placement surface on which an object to be measured is to be placed;
a measurer configured to measure a shape of the object to be measured placed on the placement surface of the sample stage; and
a pattern projector configured to project a predetermined pattern onto the sample stage, the predetermined pattern further configured to provide a reference for at least one of a placement position and a direction of the object to be measured on the placement surface, wherein the pattern projector comprises:
a mask configured to display the predetermined pattern, the mask including a shield and a transparent section;
a light source configured to emit light onto the mask such that the emitted light does not pass through the shield, and such that that the emitted light can pass through the transparent section; and
a projection optical system configured to project the emitted light through the mask onto the sample stage; and
an adjuster that provides for the adjustment of at least one of the color and intensity of the light projected from the pattern projector, according to reflectance of the measured object.
8. The image measuring apparatus according to claim 1 , wherein the pattern projector is mounted to the imager.
9. The image measuring apparatus according to claim 1 , wherein the mask is perpendicular with respect to an optical axis of the light source.
10. The image measuring apparatus according to claim 7 , wherein the pattern projector is mounted to the imager.
11. The image measuring apparatus according to claim 7 , wherein the mask is perpendicular with respect to an optical axis of the light source.
12. An image measuring apparatus comprising:
a sample stage having a placement surface on which an object to be measured is to be placed;
an imager facing the placement surface of the sample stage and configured to capture an image of the object to be measured;
pattern projector configured to project a predetermined pattern onto the sample stage, the predetermined pattern providing a reference for at least one of a placement position and a direction of the object to be measured on the placement surface, wherein the pattern projector comprises:
a pattern generator configured to generate the predetermined pattern based on input image data;
a light source configured to emit the light onto the pattern generator; and
a projection optical system configured to project the light emitted from the light source and through the pattern generator onto the sample stage; and
an adjuster that provides for the adjustment of at least one of the color and intensity of the light projected from the pattern projector, according to reflectance of the measured object.
13. The image measuring apparatus according to claim 12 , wherein the pattern projector is mounted to the imager.