IP Library › Granted Patent US 9,553,238
Granted Patent B2
US 9,553,238 · App. 14/947,716 · Granted Jan 24, 2017

Method of manufacturing light emitting element

Inventors: Kazuki Kashimoto (Tokushima, JP); Masafumi Itasaka (Itano-gun, JP); Hisashi Kasai (Tokushima, JP); Naoki Azuma (Katsuura-gun, JP)
Assignee: NICHIA CORPORATION
H01L33/385H01L33/08H01L33/382H01L2933/0016
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Quick Facts
Patent No.
US 9,553,238
App. No.
14/947,716
Granted
Jan 24, 2017
Kind
B2
Abstract

A method of manufacturing a semiconductor light emitting element includes forming a semiconductor stacked layer body on a substrate, the semiconductor stacked layer body including a first semiconductor layer and a second semiconductor layer; removing a portion of the semiconductor stacked layer body and exposing the first semiconductor layer such that the second semiconductor layer includes an extending portion that extends in a plane direction; forming a conductor layer electrically connecting the first semiconductor layer and the extending portion of the second semiconductor layer; forming a first electrode electrically connected to the first semiconductor layer and a second electrode electrically connected to the second semiconductor layer; forming a protective film covering at least a portion of the first electrode and at least a portion of the second electrode; and after forming the protective film, removing a portion of the exposed portion of the extending portion.

Claims (26)

1. A method of manufacturing a semiconductor light emitting element comprising:

forming a semiconductor stacked layer body on a substrate, the semiconductor stacked layer body comprising a first semiconductor layer and a second semiconductor layer having different conductivity types;

removing a portion of the semiconductor stacked layer body and exposing the first semiconductor layer such that the second semiconductor layer includes an extending portion that extends in a plane direction;

forming a conductor layer electrically connecting the first semiconductor layer and the extending portion of the second semiconductor layer such that a portion of an upper surface of the extending portion remains exposed from the conductor layer;

after forming the conductor layer, forming a first electrode electrically connected to the first semiconductor layer and a second electrode electrically connected to the second semiconductor layer;

forming a protective film covering at least a portion of the first electrode and at least a portion of the second electrode; and

after forming the protective film, removing a portion of the exposed portion of the extending portion.

2. The method of manufacturing a semiconductor light emitting element according to claim 1 , wherein the extending portion is formed at an end portion of a periphery of the semiconductor light emitting element.

3. The method of manufacturing a semiconductor light emitting element according to claim 1 , wherein the semiconductor light emitting element has a substantially rectangular shape in a plan view and the extending portion is formed at a corner of the semiconductor light emitting element.

4. The method of manufacturing a semiconductor light emitting element according to claim 2 , wherein the semiconductor light emitting element has a substantially rectangular shape in a plan view and the extending portion is formed at a corner of the semiconductor light emitting element.

5. The method of manufacturing a semiconductor light emitting element according to claim 1 , wherein, in the step of forming the conductor layer, the conductor layer is formed so as to connect a tip side portion of the extending portion to the exposed first semiconductor layer.

6. The method of manufacturing a semiconductor light emitting element according to claim 2 , wherein, in the step of forming the conductor layer, the conductor layer is formed so as to connect a tip side portion of the extending portion to the exposed first semiconductor layer.

7. The method of manufacturing a semiconductor light emitting element according to claim 3 , wherein, in the step of forming the conductor layer, the conductor layer is formed so as to connect a tip side portion of the extending portion to the exposed first semiconductor layer.

8. The method of manufacturing a semiconductor light emitting element according to claim 1 , wherein, in the step of forming the electrodes, the first electrode and the second electrode are simultaneously formed using a same material.

9. The method of manufacturing a semiconductor light emitting element according to claim 2 , wherein, in the step of forming the electrodes, the first electrode and the second electrode are simultaneously formed using a same material.

10. The method of manufacturing a semiconductor light emitting element according to claim 3 , wherein, in the step of forming the electrodes, the first electrode and the second electrode are simultaneously formed using a same material.

11. The method of manufacturing a semiconductor light emitting element according to claim 1 , wherein the first electrode and the second electrode are made of different materials, and in the step of forming the electrodes, the second electrode is formed after forming the first electrode.

12. The method of manufacturing a semiconductor light emitting element according to claim 2 , wherein the first electrode and the second electrode are made of different materials, and in the step of forming the electrodes, the second electrode is formed after forming the first electrode.

13. The method of manufacturing a semiconductor light emitting element according to claim 1 , wherein the first electrode and the second electrode are made of different materials, and in the step of forming the electrodes, the first electrode is formed after forming the second electrode.

14. The method of manufacturing a semiconductor light emitting element according to claim 2 , wherein the first electrode and the second electrode are made of different materials, and in the step of forming the electrodes, the first electrode is formed after forming the second electrode.

15. The method of manufacturing a semiconductor light emitting element according to claim 1 , further comprising, after the step of forming the conductor layer and before the step of forming the electrodes, forming a dielectric multilayer film on an upper surface of the semiconductor stacked layer body.

16. The method of manufacturing a semiconductor light emitting element according to claim 8 , wherein the dielectric multilayer film is formed such that the portion for removing the extending portion in the step of removing is exposed.

17. The method of manufacturing a semiconductor light emitting element according to claim 1 , wherein the protective film is formed such that the portion for removing the extending portion in the step of removing is exposed.

18. The method of manufacturing a semiconductor light emitting element according to claim 2 , wherein the protective film is formed such that the portion for removing the extending portion in the step of removing is exposed.

19. The method of manufacturing a semiconductor light emitting element according to claim 3 , wherein the protective film is formed such that the portion for removing the extending portion in the step of removing is exposed.

20. The method of manufacturing a semiconductor light emitting element according to claim 1 , further comprising, after the step of removing, forming, on an upper surface of the protective film, a first connection electrode that is electrically connected to the first electrode and a second connection electrode that is electrically connected to the second electrode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 23, 2015
From: KASHIMOTO, KAZUKI; ITASAKA, MASAFUMI; KASAI, HISASHI; AZUMA, NAOKI
To: NICHIA CORPORATION
Reel/Frame 037117/0689 →
Priority Claims (1)
JP 2014-237127 · Nov 21, 2014 · national
Continuity (1)
Related Publication 20160149085A1 · May 26, 2016