Memory cells having electrically conductive nanodots

1. A memory cell, comprising:

a first dielectric between a charge storage material and a semiconductor;

a plurality of electrically conductive nanodots between the charge storage material and a control gate; and

a second dielectric between the control gate and the plurality of electrically conductive nanodots;

wherein each electrically conductive nanodot of the plurality of electrically conductive nanodots is

in contact with a particular surface between the charge storage material and the second dielectric; and

wherein a portion of the second dielectric is in contact with the particular surface.

2. The memory cell of claim 1 , wherein the charge storage material comprises an electrically conductive charge storage material.

3. The memory cell of claim 2 , wherein the conductive charge storage material comprises a conductively doped semiconductor material.

4. The memory cell of claim 1 , wherein the charge storage material comprises a silicon-containing material.

5. The memory cell of claim 4 , wherein the silicon-containing material comprises at least one material selected from the group consisting of monocrystalline silicon, amorphous silicon and polycrystalline silicon.

6. The memory cell of claim 1 , further comprising a barrier material between the charge storage material and the plurality of electrically conductive nanodots, wherein the particular surface is a surface of the barrier material.

7. The memory cell of claim 6 , wherein the barrier material is a nitridized material selected from the group consisting of a nitridized product of the charge storage material and a nitridized product of an oxidized product of the charge storage material.

8. The memory cell of claim 6 , wherein a portion of the second dielectric is in contact with the surface of the barrier material.

9. The memory cell of claim 8 , wherein each of the electrically conductive nanodots of the plurality of electrically conductive nanodots is in contact with the surface of the barrier material.

10. The memory cell of claim 1 , wherein each of the electrically conductive nanodots of the plurality of electrically conductive nanodots is in contact with material other than the second dielectric.

11. The memory cell of claim 10 , wherein each of the electrically conductive nanodots of the plurality of electrically conductive nanodots is overlying and in contact with the charge storage material, wherein the particular surface is a surface of the charge storage material.

12. A memory cell, comprising:

a first dielectric between an electrically conductive charge storage material and a semiconductor;

a plurality of metal-containing electrically conductive nanodots between the electrically conductive charge storage material and a control gate;

a dielectric barrier between the plurality of metal-containing electrically conductive nanodots and the electrically conductive charge storage material; and

a second dielectric between the control gate and the metal-containing electrically conductive nanodots;

wherein each metal-containing electrically conductive nanodot of the plurality of metal-containing electrically conductive nanodots is

in contact with a surface of the dielectric barrier; and

wherein a portion of the second dielectric is in contact with the surface of the dielectric barrier.

13. The memory cell of claim 12 , wherein the electrically conductive charge storage material comprises a silicon-containing material selected from the group consisting of conductively doped monocrystalline silicon, conductively doped amorphous silicon and conductively doped polycrystalline silicon.

14. The memory cell of claim 12 , wherein the dielectric barrier comprises a silicon-containing dielectric material selected from the group consisting of a silicon oxide, a silicon nitride and a silicon oxynitride.

15. The memory cell of claim 12 , wherein the electrically conductive charge storage material comprises a silicon-containing material and wherein the dielectric barrier comprises nitridized silicon-containing material of the electrically conductive charge storage material.

16. The memory cell of claim 12 , wherein the plurality of metal-containing electrically conductive nanodots comprise nanodots comprising at least one metal-containing material selected from the group consisting of elemental metals, metal alloys, metal nitrides and metal silicides.

17. The memory cell of claim 16 , wherein the metals of the elemental metals, metal alloys, metal nitrides and metal silicides of the at least one metal-containing material are selected from the group consisting of titanium, tantalum, tungsten, ruthenium, rhodium, and platinum.

18. A memory cell, comprising:

a first dielectric between an electrically conductive silicon-containing charge storage material and a semiconductor;

a plurality of metal-containing electrically conductive nanodots between the electrically conductive silicon-containing charge storage material and a control gate;

a nitridized dielectric barrier between the plurality of metal-containing electrically conductive nanodots and the electrically conductive silicon-containing charge storage material; and

a second dielectric between the control gate and the metal-containing electrically conductive nanodots;

wherein each metal-containing electrically conductive nanodot of the plurality of metal-containing electrically conductive nanodots is

in contact with a surface of the nitridized dielectric barrier; and

wherein a portion of the second dielectric is in contact with the surface of the nitridized dielectric barrier.

19. The memory cell of claim 18 , wherein only a portion of the second dielectric is in contact with the nitridized dielectric barrier.

20. The memory cell of claim 19 , wherein a portion of each of the metal-containing electrically conductive nanodots of the plurality of metal-containing electrically conductive nanodots is in contact with the surface of the nitridized dielectric barrier.