Spin chuck with in situ cleaning capability
In a method and apparatus for processing wafer-shaped articles, a spin chuck is positioned inside a process chamber. The spin chuck is configured to hold a wafer-shaped article at a predetermined process position. A cover covers the spin chuck and is affixed to or integral with the spin chuck for rotation therewith. The cover has a central opening. A stationary nozzle assembly extends into the process chamber such that a discharge end of the stationary nozzle assembly passes through the central opening of the cover. The nozzle assembly comprises a rinse nozzle configured to direct rinse liquid radially outwardly of the nozzle assembly onto a downwardly-facing surface of the cover.
1. An apparatus for processing a wafer-shaped article, the apparatus comprising:
a process chamber;
a spin chuck positioned inside the process chamber, wherein the spin chuck is configured to hold the wafer-shaped article at a predetermined process position;
a cover covering the spin chuck and affixed to the spin chuck, wherein the cover rotates with the spin chuck and has a central opening;
a stationary nozzle assembly that extends into the process chamber, such that a discharge end of the stationary nozzle assembly passes through the central opening of the cover, wherein the stationary nozzle assembly comprises a rinse nozzle, and wherein the rinse nozzle is configured to direct a rinse liquid radially outwardly of the stationary nozzle assembly onto a downwardly-facing surface of the cover; and
an annular lid disposed around the stationary nozzle assembly and configured to close off the process chamber, wherein the annular lid is stationary with the stationary nozzle assembly,
wherein
the cover extends radially outward from an area between a portion of the annular lid and a portion of the stationary nozzle assembly to the spin chuck,
an annular center portion of the cover splits gas received from an annular nozzle of the stationary nozzle assembly, where a first portion of the gas is provided to a second area between the annular lid and the cover and a second portion of the gas is provided to a third area, and
the third area is on an opposite side of the cover as the second area.
2. The apparatus of claim 1 , wherein the annular nozzle directs the gas over an inner circumferential edge of the cover to the second area and the third area.
3. The apparatus of claim 1 , wherein the annular center portion is disposed in the area between the portion of the annular lid and the portion of the stationary nozzle assembly.
4. The apparatus of claim 1 , wherein the annular center portion extends axially and away from a radially extending portion of the cover.
5. The apparatus of claim 1 , wherein the annular nozzle is disposed radially outward of the rinse nozzle.
6. The apparatus of claim 5 , wherein:
the stationary nozzle assembly comprises a stationary nozzle head; and
the stationary nozzle head is disposed between (i) the rinse nozzle and (ii) the area between the portion of the annular lid and the portion of the stationary nozzle assembly.