Semiconductor device
The present invention is to provide a semiconductor device in which the generation of the eddy current in a metal flat plate is reduced, and the Q value of the RF circuit of the semiconductor device is improved even using the metal flat plate as a support.
1. A semiconductor device comprising:
a metal flat plate;
a first insulating material layer formed on one main surface of the metal flat plate;
a semiconductor chip mounted on the surface of the first insulating material layer via an adhesion layer with an element circuit surface oriented upward;
a second insulating material layer that seals the semiconductor chip and the periphery thereof;
a wiring layer that is provided in the second insulating material layer and is partially extended to a peripheral region of the semiconductor chip;
a conductive portion that is provided in the second insulating material layer and connects an electrode on the element circuit surface of the semiconductor chip and the wiring layer; and
an external electrode formed on the wiring layer.
2. A semiconductor device comprising:
a metal flat plate;
a first insulating material layer formed on one main surface of the metal flat plate;
a semiconductor chip;
a second insulating material layer that encapsulates the semiconductor chip and the periphery thereof;
a wiring layer that is provided in the second insulating material layer and is partially extended to a peripheral region of the semiconductor chip;
a conductive portion that is provided in the second insulating material layer and connects an electrode on the element circuit surface of the semiconductor chip and the wiring layer; and
a metal via that is provided in the insulating material layers and is electrically connected to the wiring layer, wherein
the semiconductor chip is provided in plurality,
the semiconductor chip that is closest to the metal flat plate is fixed on the surface of the first insulating material layer via an adhesion layer with the element circuit surface oriented upward, and
the other semiconductor chips are laminated via an insulating material that forms the second insulating material layer with the element circuit surfaces oriented toward the wiring layer side.
3. The semiconductor device according to claim 2 , wherein the plurality of semiconductor chips are arranged so that the position of an RF circuit of each semiconductor chip does not overlap with an adjacent semiconductor chip.
4. The semiconductor device according to claim 1 , wherein the thickness of the first insulating material layer is 20 μm or more.
5. The semiconductor device according to claim 1 , wherein the first insulating material layer is formed of two or more insulating material layers.
6. The semiconductor device according to claim 1 , wherein a portion of the metal flat plate that faces the semiconductor chip has a concave portion, and the concave portion is filled with a first insulating material.