IP Library Granted Patent US 9,799,484
Granted Patent B2
US 9,799,484 · App. 14/964,221 · Granted Oct 24, 2017

Charged particle source

Inventor: Shuai Li (Fremont, CA)
Assignee: HERMES MICROVISION, INC.
H01J37/143H01J3/20H01J37/09H01J37/28H01J2237/0453H01J2237/063H01J2237/141H01J2237/1415H01J2237/2806H01J2237/2817
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Quick Facts
Patent No.
US 9,799,484
App. No.
14/964,221
Granted
Oct 24, 2017
Kind
B2
Abstract

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Claims (13)

1. A charged particle source, comprising:

an emitter, providing a charged particle beam;

an extraction electrode, extracting charged particles away from the emitter; and

a means for providing a magnetic field having a magnetic field strength, wherein the magnetic field strength is zero at a tip of the emitter, and the magnetic field strength increases to a local maximum after the tip and before the extraction electrode along an optical axis of the charged particle beam.

2. The charged particle source according to claim 1 , wherein said charged particle source is an electron source.

3. The charged particle source according to claim 1 , wherein the extraction electrode is disposed below a top surface of a lower magnetic lens of the means for providing the magnetic field.

4. A charged particle source, comprising:

a charged particle emitter;

an extraction electrode, extracting a charged particle beam from a tip of the charged particle emitter; and

a magnetic field generator, positioned to provide a magnetic field having a magnetic field strength, wherein said magnetic field strength is zero at said tip and said magnetic field strength is a local maximum before the extraction electrode along an optical axis of the charged particle beam.

5. The charged particle source of claim 4 , wherein said charged particle emitter is a cathode electron source.

6. The charged particle source of claim 4 , further comprising a suppressor electrode disposed radially around said charged particle emitter and coaxial with said charged particle beam, wherein said suppressor electrode and said charged particle beam have a first electric polarity.

7. The charged particle source according to claim 4 , wherein the extraction electrode is disposed below a top surface of a magnetic lens of the means for providing the magnetic field.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION, INC.
To: HERMES MICROVISION INCORPORATED B.V.
Reel/Frame 054866/0742 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION INCORPORATED B.V.
To: ASML NETHERLANDS B.V.
Reel/Frame 054870/0156 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2016
From: LI, SHUAI
To: HERMES MICROVISION INC.
Reel/Frame 040774/0317 →
Continuity (2)
Provisional Application 62089609 · Dec 9, 2014
Related Publication 20160163500A1 · Jun 9, 2016