IP Library Granted Patent US 9,583,306
Granted Patent B2
US 9,583,306 · App. 14/964,274 · Granted Feb 28, 2017

Swing objective lens

Inventor: Shuai Li (Fremont, CA)
Assignee: HERMES MICROVISION INC.
H01J37/1478H01J37/145H01J37/21H01J37/28H01J2237/063H01J2237/1035H01J2237/12H01J2237/14H01J2237/1508H01J2237/2801
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Quick Facts
Patent No.
US 9,583,306
App. No.
14/964,274
Granted
Feb 28, 2017
Kind
B2
Abstract

A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.

Claims (39)

1. A system for tilting a charged particle beam focused by an immersion objective lens, comprising:

a pre-lens deflector above and adjacent to a magnetic field generated by the immersion objective lens, said pre-lens deflector deflecting the charged particle beam to a pre-determined angle; and

a swing deflector, located inside said immersion objective lens, for swinging a magnetic lens generated by the immersion objective lens into the pre-determined angle, such that the charged particle beam is focused by the swung magnetic lens and bombards a specimen with the pre-determined angle.

2. The system according to claim 1 , wherein the charged particle beam is an electron beam.

3. A swing objective lens, comprising:

an immersion objective lens for focusing a charged particle beam on a specimen;

a pre-lens deflector above and adjacent to a magnetic lens generated by the immersion objective lens, said pre-lens deflecting the charged particle beam to a pre-determined angle; and

a swing deflector, located inside said magnetic lens, providing an electrostatic field with a first condition;

wherein when the first condition matches a second condition generated by the immersion objective lens and the swing deflector, the magnetic lens is swung into the pre-determined angle.

4. The swing objective lens according to claim 3 , wherein the first condition is [φ′(z)+½″(z)(z−z 0 )], and φ is an electric potential produced by the swing deflector.

5. The swing objective lens according to claim 4 , wherein the second condition is √{square root over (φ(z))}[B(z)+½B′(z)(z−z 0 )], and B is the magnetic field generated by the immersion objective lens.

6. The swing objective lens according to claim 5 , wherein the match is the first condition mostly overlapped with the second condition.

7. The swing objective lens according to claim 5 , wherein the match is a first peak value of the first condition close to a second peak value of the second condition.

8. The swing objective lens according to claim 5 , wherein the match is a first distribution of the first condition similar and close to a second distribution of the second condition.

9. A swing objective lens, comprising:

an immersion objective lens for focusing a charged particle beam on a specimen, wherein the charged particle beam along an optical axis;

a pre-lens deflector above and adjacent to a magnetic lens generated by the immersion objective lens, said pre-lens deflecting the charged particle beam to a pre-determined angle; and

a swing deflector, located inside said magnetic lens, a first portion of an inner surface of the swing deflector having an inclined angle to the optical axis and a second portion of the inner surface of the swing deflector being parallel to the optical axis, wherein the magnetic lens is swung by the swing deflector into the pre-determined angle.

10. The swing objective lens according to claim 9 , wherein the swing deflector generates an electric potential φ with a first condition, [φ′(z)+½φ″(z)(z−z 0 )].

11. The swing objective lens according to claim 10 , wherein the immersion objective lens generates a magnetic field B with a second condition, √{square root over (φ(z))}[B(z)+½′(z)(z−z 0 )].

12. The swing objective lens according to claim 11 , wherein the first condition matches the second condition.

13. The swing objective lens according to claim 12 , wherein the match is a first distribution of the first condition similar and close to a second distribution of the second condition.

14. The swing objective lens according to claim 13 , further comprising a scanning deflector unit for scanning the charged particle beam on the specimen.

15. The swing objective lens according to claim 14 , further comprising a retard electrode below the immersion objective lens.

16. A scanning electron microscope, comprising:

an electron source for providing an electron beam along an optical axis;

a condenser lens for condensing the electron beam;

a detector for receiving signal electrons emanating from the specimen; and

a swing objective lens, comprising:

an immersion objective lens for focusing a charged particle beam on a specimen,

wherein the charged particle beam along an optical axis, wherein the immersion objective lens generates a magnetic field B with a second condition, √{square root over (φ(z))}[B(z)+½B′(z)(z−z 0 )];

a pre-lens deflector above and adjacent to a magnetic lens generated by the immersion objective lens, said pre-lens deflecting the charged particle beam to a pre-determined angle;

a swing deflector, located inside said magnetic lens, a first portion of an inner surface of the swing deflector having an inclined angle to the optical axis and a second portion of the inner surface of the swing deflector being parallel to the optical axis, wherein the magnetic lens is swung by the swing deflector into the pre-determined angle, the swing deflector generates an electric potential co with a first condition, [φ′(z)+½φ″(z)(z−z 0 )], and a first distribution of the first condition similar and close to a second distribution of the second condition;

a scanning deflector unit for scanning the charged particle beam on the specimen.; and

a retard electrode below the immersion objective lens.

17. A method for tilting a charged particle beam, comprising:

deflecting the charged particle beam to a pre-determined angle;

providing an immersion magnetic lens to the charged particle beam such that the charged particle beam is focused on a specimen; and

providing a swinging electrostatic field to the immersion magnetic lens such that the immersion magnetic lens is swung to the pre-determined angle, wherein the swing electric field has a first condition match to a second condition generated by the immersion magnetic lens and the swinging electrostatic field.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION, INC.
To: HERMES MICROVISION INCORPORATED B.V.
Reel/Frame 054866/0742 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION INCORPORATED B.V.
To: ASML NETHERLANDS B.V.
Reel/Frame 054870/0156 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2016
From: LI, SHUAI
To: HERMES MICROVISION INC.
Reel/Frame 040774/0548 →
Continuity (2)
Provisional Application 62089547 · Dec 9, 2014
Related Publication 20160172150A1 · Jun 16, 2016