Deposition apparatus and deposition method using the same
A deposition apparatus for manufacturing a display device is disclosed. In one aspect, the apparatus includes a substrate fixing portion configured to fix a deposition substrate to a lower portion thereof and a first mask transfer portion placed on one side of the substrate fixing portion and configured to move the deposition mask upwardly such that the deposition mask is formed spaced apart from the deposition substrate by a predetermined distance. The apparatus also includes a substrate transfer portion configured to move the deposition substrate such that the deposition substrate passes over the deposition mask. The apparatus further includes a mask spacing portion positioned on the substrate fixing portion and configured to maintain a substantially uniform distance between the deposition substrate and the deposition mask when the deposition substrate is moved and a deposition source configured to deposit a deposition material on the deposition substrate through the deposition mask.
1. A deposition apparatus for manufacturing a display device, comprising:
a substrate fixing portion configured to fix a deposition substrate, on which a deposition material is deposited, to a lower portion thereof;
a first mask transfer portion placed on one side of the substrate fixing portion and configured to move a deposition mask upwardly such that the deposition mask is formed spaced apart from the deposition substrate by a predetermined distance;
a substrate transfer portion configured to move the deposition substrate in a substantially horizontal direction such that the deposition substrate passes over the deposition mask, wherein the first mask transfer portion and the substrate fixing portion are arranged side by side in the horizontal movement direction of the deposition substrate;
a mask spacing portion positioned on the substrate fixing portion and configured to maintain a substantially uniform distance between the deposition substrate and the deposition mask when the deposition substrate is moved; and
a deposition source configured to deposit a deposition material on the deposition substrate through the deposition mask.
2. The deposition apparatus of claim 1 , further comprising a first auxiliary substrate formed under the first mask transfer portion and arranged side by side with the deposition substrate.
3. The deposition apparatus of claim 2 , wherein the first auxiliary substrate is formed of the same material as the deposition substrate.
4. The deposition apparatus of claim 2 , wherein the first auxiliary substrate is formed between the first mask transfer portion and the deposition mask.
5. The deposition apparatus of claim 1 , wherein the substrate fixing portion comprises a bipolar electrostatic chuck or a mono-polar electrostatic chuck.
6. The deposition apparatus of claim 1 , wherein the mask spacing portion is configured to maintain the distance based on magnetic force.
7. The deposition apparatus of claim 1 , wherein the substrate fixing portion has a larger area than the deposition substrate.
8. The deposition apparatus of claim 1 , further comprising first and second auxiliary substrates formed on opposing sides of the deposition substrate.
9. The deposition apparatus of claim 8 , wherein the thicknesses of the first and second auxiliary substrates are substantially the same as that of the deposition substrate.
10. The deposition apparatus of claim 1 , wherein the first mask transfer portion directly contacts the substrate fixing portion.
11. A deposition apparatus for manufacturing a display device, comprising:
a substrate fixing portion configured to fix a deposition substrate, on which a deposition material is deposited, to a lower portion thereof;
a first mask transfer portion placed on one side of the substrate fixing portion and configured to move a deposition mask upwardly such that the deposition mask is formed spaced apart from the deposition substrate by a predetermined distance;
a substrate transfer portion configured to move the deposition substrate in a substantially horizontal direction such that the deposition substrate passes over the deposition mask;
a mask spacing portion positioned on the substrate fixing portion and configured to maintain a substantially uniform distance between the deposition substrate and the deposition mask when the deposition substrate is moved;
a deposition source configured to deposit a deposition material on the deposition substrate through the deposition mask; and
a second mask transfer portion formed on another side of the substrate fixing portion and configured to move the deposition mask downwardly from the deposition substrate.
12. The deposition apparatus of claim 11 , wherein the first and second mask transfer portions are respectively located on front and rear sides of the deposition substrate in a movement direction of the deposition substrate.
13. The deposition apparatus of claim 11 , further comprising a second auxiliary substrate formed under the second mask transfer portion and arranged side by side with the deposition substrate.
14. The deposition apparatus of claim 13 , wherein the second auxiliary substrate is formed of the same material as the deposition substrate.
15. The deposition apparatus of claim 11 , wherein the second mask transfer portion comprises a mono-polar electrostatic chuck.