Wafer level packaging, optical detection sensor and method of forming same
An optical detection sensor functions as a proximity detection sensor that includes an optical system and a selectively transmissive structure. Electromagnetic radiation such as laser light can be emitted through a transmissive portion of the selectively transmissive structure. A reflected beam can be detected to determine the presence of an object. The sensor is formed by encapsulating the transmissive structure in a first encapsulant body and encapsulating the optical system in a second encapsulant body. The first and second encapsulant bodies are then joined together. In a wafer scale assembling the structure resulting from the joined encapsulant bodies is diced to form optical detection sensors.
1. A method, comprising:
forming a transmissive structure, comprising:
placing a first region of transmissive material and a second region of transmissive material on a first support; and
encapsulating the first and second regions of transmissive material with an encapsulant to form a first encapsulating body for said transmissive structure;
forming an optical system, comprising:
placing an electromagnetic emitter circuit and an electromagnetic sensor circuit on a second support; and
encapsulating the electromagnetic emitter circuit and electromagnetic sensor circuit with an encapsulant to form a second encapsulating body for said optical system; and
joining the first encapsulating body to the second encapsulating body such that said first region of transmissive material is aligned with the electromagnetic emitter circuit and said second region of transmissive material is aligned with said electromagnetic sensor circuit.
2. The method of claim 1 , wherein said electromagnetic sensor circuit includes a first sensor region and a second sensor region and wherein said second region of transmissive material is aligned with said second sensor region of the electromagnetic sensor circuit.
3. The method of claim 2 , further comprising positioning an optical barrier between the first and second sensor regions prior to joining the first encapsulating body to the second encapsulating body.
4. The method of claim 3 , further comprising attaching the optical barrier to a top surface of an integrated circuit chip for said electromagnetic sensor circuit.
5. The method of claim 1 , further comprising dicing a wafer of transparent material to form said first and second regions of transmissive material.
6. The method of claim 5 , further comprising, before dicing, forming a channel in a surface of the wafer, said dicing performed at locations such that first regions of transmissive material are formed at the channel so as to have an L-shapes cross section and said second regions of transmissive material are formed adjacent the channel so as to have a rectangular cross-section.
7. The method of claim 1 , wherein forming the optical system further comprises placing conductive plugs on the second support, and wherein encapsulating the electromagnetic emitter circuit and electromagnetic sensor circuit with the encapsulant to form the second encapsulating body further comprises encapsulating said conductive plugs.
8. A method, comprising:
forming a first encapsulating body including a plurality of transmissive structures, comprising:
placing for each transmissive structure a first region of transmissive material and a second region of transmissive material on a first support; and
encapsulating the first and second regions of transmissive material for each of the plurality of transmissive structures with an encapsulant to form said first encapsulating body;
forming a second encapsulating body including a plurality of optical systems, comprising:
placing for each optical system an electromagnetic emitter circuit and an electromagnetic sensor circuit on a second support; and
encapsulating the electromagnetic emitter circuit and electromagnetic sensor circuit for each of the optical systems with an encapsulant to form said second encapsulating body;
joining the first encapsulating body to the second encapsulating body such that each first region of transmissive material is aligned with one of the electromagnetic emitter circuits and each second region of transmissive material is aligned with one of the electromagnetic sensor circuits to produce a combined structure; and
dicing the combined structure to form a plurality of optical detection sensors, wherein each optical detection sensor includes one transmissive structure and one optical system.
9. The method of claim 8 , wherein each electromagnetic sensor circuit includes a first sensor region and a second sensor region and wherein each second region of transmissive material is aligned with said second sensor region of the electromagnetic sensor circuit.
10. The method of claim 9 , further comprising positioning an optical barrier between the first and second sensor regions prior to joining the first encapsulating body to the second encapsulating body.
11. The method of claim 10 , further comprising attaching the optical barrier to a top surface of an integrated circuit chip for said electromagnetic sensor circuit.
12. The method of claim 8 , further comprising dicing a wafer of transparent material to form said first and second regions of transmissive material.
13. The method of claim 12 , further comprising, before dicing, forming a channel in a surface of the wafer, said dicing performed at locations such that first regions of transmissive material are formed at the channel so as to have an L-shapes cross section and said second regions of transmissive material are formed adjacent the channel so as to have a rectangular cross-section.
14. The method of claim 8 , wherein forming the second encapsulating body further comprises placing conductive plugs on the second support, and wherein encapsulating the electromagnetic emitter circuit and electromagnetic sensor circuit with the encapsulant to form the second encapsulating body further comprises encapsulating said conductive plugs.