Edge ring for a substrate processing chamber
An edge ring and process for fabricating an edge ring are disclosed herein. In one embodiment, an edge ring includes an annular body and a plurality of thermal breaks disposed within the annular body. The thermal breaks are disposed perpendicular to a center line of the annular body of the edge ring.
1. An edge ring for a substrate processing chamber, the edge ring comprising:
an annular body comprising a first material; and
a plurality of thermal breaks comprising a second material having a higher coefficient of thermal conductivity relative to the first material, wherein
each of the plurality of thermal breaks is encapsulated within the first material of the annular body, the thermal breaks disposed perpendicular to a centerline of the annular body and configured to disperse heat laterally throughout the edge ring while inhibiting axial heat transfer along the centerline.
2. The edge ring of claim 1 , wherein the edge ring further comprises a gas distribution system disposed within the annular body.
3. The edge ring of claim 2 , wherein the gas distribution system extends down a side wall of the annular body.
4. The edge ring of claim 1 , wherein the edge ring further comprises:
a coating comprising a third material having a lower coefficient of thermal conductivity relative to the first material.
5. The edge ring of claim 4 , wherein the third material of the coating is a material selected from the group consisting of zirconium oxide, carbon in diamond form, and quartz.
6. The edge ring of claim 4 , wherein the third material of the coating comprises yttrium stabilized zirconium oxide.
7. The edge ring of claim 4 , wherein the coating has a thickness between 100 to 200 microns.
8. The edge ring of claim 1 , wherein the thermal breaks extend down a side wall of the annular body.
9. The edge ring of claim 1 , wherein the edge ring is fabricated using a 3D printer.
10. The edge ring of claim 1 , wherein the edge ring is casted.
11. A processing chamber, comprising:
a substrate support member configured to process a substrate; and
an edge ring supported by the substrate support member, the edge ring comprising:
an annular body comprising a first material; and
a plurality of thermal breaks comprising a second material having a higher coefficient of thermal conductivity relative to the first material, wherein
each of the plurality of thermal breaks is encapsulated within the first material of the annular body, the thermal breaks disposed perpendicular to a centerline of the annular body and configured to disperse heat laterally throughout the edge ring while inhibiting axial heat transfer along the centerline.
12. The processing chamber of claim 11 , wherein the edge ring further comprises a gas distribution system disposed within the annular body.
13. The processing chamber of claim 12 , wherein the gas distribution system extends down a side wall of the annular body.
14. The processing chamber of claim 11 , wherein the edge ring further comprises:
a coating comprising a third material having a lower coefficient of thermal conductivity relative to the first material.
15. The processing chamber of claim 14 , wherein the third material of the coating is a material selected from the group consisting of zirconium oxide, carbon in diamond form, and quartz.
16. The processing chamber of claim 14 , wherein the third material of the coating comprises yttrium stabilized zirconium oxide.
17. The processing chamber of claim 14 , wherein the coating has a thickness between 100 to 200 microns.
18. The processing chamber of claim 11 , wherein the thermal breaks extend down a side wall of the annular body.
19. The processing chamber of claim 11 , wherein the edge ring is fabricated using a 3D printer.
20. The processing chamber of claim 11 , wherein the edge ring is casted.