Composition of matter and molecular resist made therefrom
The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R 1 is a saturated or unsaturated group having from 1-4 carbon atoms, R 2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R 3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R 4 is a saturated or unsaturated group having from 1-4 carbon atoms and A − is an anion.
1. A composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III);
wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R 1 is a saturated or unsaturated group having from 1-4 carbon atoms, R 2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R 3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R 4 is a saturated or unsaturated group having from 1-4 carbon atoms, and A − is an anion.
2. The composition of matter of claim 1 , wherein at least one of X or Y comprises a tert-butyl carbonate group.
3. The composition of matter of claim 1 , wherein at least one of X or Y comprises
-(alkyl)j-(aryl) k -(O) p -(COO) q -LG
wherein i, j, k, p, and q take the values in the following table:
-alkyl-
-aryl-
—O—
—COO—
j
k
p
q
1
1
1
1
1
1
0
1
1
1
1
0
1
0
0
1
1
0
1
0
0
1
1
1
0
1
0
1
0
1
1
0
0
0
0
1
wherein alkyl is a branched or unbranched, substituted or unsubstituted divalent alkyl chain of 1-16 carbon atoms having 0-16 heteroatoms substituted into the chain, aryl is a substituted or unsubstituted divalent phenyl group, divalent heteroaromatic group, or divalent fused aromatic or fused heteroaromatic group, and wherein LG is a leaving group.
4. The composition of matter of claim 3 , wherein the leaving group is a tert-butyl group, a tert-pentyl group, a 2,3-dimethylbutan-2-yl group, a 2,3,3-trimethylbutan-2-yl group, a 2,3-dimethylpentan-3-yl group, a 2-methylbicyclo[2.2.1]heptan-2-yl group, a bicyclo[2.2.1]heptan-2-yl group, a 1-methylcyclopentyl group, a 1-ethylcyclopentyl group, a 1-methylcyclohexyl group, a 1-ethylcyclohexyl group, a 2-methyladamantyl group, or a 2-ethyladamantyl group.
5. The composition of matter of claim 1 , further comprising, in admixture, one or more photoacid generators chosen from a sulfonium salt, an iodonium salt, a sulfone imide, a halogen-containing compound, a sulfone compound, an ester sulfonate compound, a diazomethane compound, a dicarboximidyl sulfonic acid ester, an ylideneaminooxy sulfonic acid ester, a sulfanyldiazomethane, or a mixture thereof.
6. The composition of matter of claim 5 , further comprising at least one crosslinker, wherein the at least one crosslinker comprises an acid sensitive monomer or polymer, and wherein the at least one crosslinker comprises at least one of a glycidyl ether, glycidyl ester, glycidyl amine, a methoxymethyl group, an ethoxy methyl group, a butoxymethyl group, a benzyloxymethyl group, dimethylamino methyl group, diethylamino methyl group, a dibutoxymethyl group, a dimethylol amino methyl group, diethylol amino methyl group, a dibutylol amino methyl group, a morpholino methyl group, acetoxymethyl group, benzyloxy methyl group, formyl group, acetyl group, vinyl group, or an isopropenyl group.
7. The composition of matter of claim 6 , wherein the at least one crosslinker comprises one or more glycidyl ether groups attached to a novolac resin.
8. A composition of matter comprising: a solvent; and an ester having a chemical structure chosen from (IV), (V), or (VI);
wherein m=1-4, n=1-4, and wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, and wherein A − is an anion.
9. The composition of matter of claim 8 , wherein at least one of X or Y comprises a tert-butylcarbonate group.
10. The composition of matter of claim 8 , wherein at least one of X or Y has the structure
-E-O p -(COO) q -LG
wherein E is an optional extender group, LG is a leaving group and p and q take values chosen from the following table:
(—E—)
(—O—)
(—COO—)
Present
p
q
Present
1
1
Present
0
1
Present
1
0
Not Present
0
1.
11. The composition of matter of claim 8 , wherein LG is a tert-butyl group.
12. The composition of matter of claim 8 , wherein LG is chosen from a tertiary alkyl or cycloalkyl group, a ketal or cyclic aliphatic ketal, or an acetal.
13. The composition of matter of claim 8 , wherein at least one of X or Y comprises
-(alkyl)j-(aryl) k -(O) p -(COO) q -LG
wherein j, k, p, and q take the values in the following table:
-alkyl-
-aryl-
—O—
—COO—
j
k
p
q
1
1
1
1
1
1
0
1
1
1
1
0
1
0
0
1
1
0
1
0
0
1
1
1
0
1
0
1
0
1
1
0
0
0
0
1
wherein alkyl is a branched or unbranched, substituted or unsubstituted divalent alkyl chain of 1-16 carbon atoms having 0-16 heteroatoms substituted into the chain, aryl is a substituted or unsubstituted divalent phenyl group, divalent heteroaromatic group, or divalent fused aromatic or fused heteroaromatic group, and wherein LG is a leaving group.
14. The composition of matter of claim 13 , wherein m=2 and n=3, and wherein the leaving group is a tert-butyl group.
15. The composition of matter of claim 14 , wherein LG is chosen from a tertiary alkyl or cycloalkyl group, a ketal or cyclic aliphatic ketal, or an acetal.
16. The composition of matter of claim 14 , wherein LG is a tert-butyl group, a tert-pentyl group, a 2,3-dimethylbutan-2-yl group, a 2,3,3-trimethylbutan-2-yl group, a 2,3-dimethylpentan-3-yl group, a 2-methylbicyclo[2.2.1]heptan-2-yl group, a bicyclo[2.2.1]heptan-2-yl group, a 1-methylcyclopentyl group, a 1-ethylcyclopentyl group, a 1-methylcyclohexyl group, a 1-ethylcyclohexyl group, a 2-methyladamantyl group, or a 2-ethyladamantyl group.
17. The composition of matter of claim 14 , further comprising, in admixture, one or more photoacid generators chosen from a sulfonium salt, an iodonium salt, a sulfone imide, a halogen-containing compound, a sulfone compound, an ester sulfonate compound, a diazomethane compound, a dicarboximidyl sulfonic acid ester, an ylideneaminooxy sulfonic acid ester, a sulfanyldiazomethane, or a mixture thereof.
18. The composition of matter of claim 8 , further comprising, in admixture, one or more photoacid generators chosen from a sulfonium salt, an iodonium salt, a sulfone imide, a halogen-containing compound, a sulfone compound, an ester sulfonate compound, a diazomethane compound, a dicarboximidyl sulfonic acid ester, an ylideneaminooxy sulfonic acid ester, a sulfanyldiazomethane, or a mixture thereof.
19. The composition of matter of claim 18 , further comprising at least one crosslinker, wherein the at least one crosslinker comprises an acid sensitive monomer or polymer, and wherein the at least one crosslinker comprises at least one of a glycidyl ether, glycidyl ester, glycidyl amine, a methoxymethyl group, an ethoxy methyl group, a butoxymethyl group, a benzyloxymethyl group, dimethylamino methyl group, diethylamino methyl group, a dibutoxymethyl group, a dimethylol amino methyl group, diethylol amino methyl group, a dibutylol amino methyl group, a morpholino methyl group, acetoxymethyl group, benzyloxy methyl group, formyl group, acetyl group, vinyl group, or an isopropenyl group.
20. The composition of matter of claim 18 , wherein the at least one crosslinker comprises one or more glycidyl ether groups attached to a novolac resin.