RF-transistors with self-aligned point contacts
View Patent ↗A method of fabricating a semiconductor device includes depositing a dielectric layer on a substrate and a nanomaterial on the dielectric layer. The method also includes depositing a thin metal layer on the nanomaterial and removing a portion of the thin metal layer from a gate area. The method also includes depositing a gate dielectric layer. The method also includes selectively removing the gate dielectric layer from a source contact region and a drain contact region. The method also includes patterning a gate electrode, a source electrode, and a drain electrode.
1. A method of forming a semiconductor device, the method comprising:
depositing carbon nanotubes on a substrate,
depositing a thin nickel layer on the carbon nanotubes,
selectively removing the thin nickel layer from a gate area of the device, and
forming end bonded contacts between the carbon nanotubes and the thin nickel layer in the gate area of the device.
2. The method of claim 1 , the method further comprising patterning a gate electrode in the gate area of the device.
3. The method of claim 1 , the method further comprising patterning a source electrode and a drain electrode on the device.