Manufacture of non-rectilinear features
View Patent ↗Methods and apparatus are disclosed for symbolic methods using algebraic geometry (e.g., based on a Gröbner basis of tangent space polynomials of parametric curves). For example, the design, optimization and verification of silicon photonic wave guides using parametric polynomials and/or Gröbner basis functions can be used to perform envelope generation, rectification, manufacturability checking, singularity detection, reticle and etch processing model generation, tapering loss minimization, and bend loss minimization. In one example, a method of analyzing a layout to be manufactured using a photolithographic process includes producing an envelope of a curve representing a layout object based at least in part on a Gröbner basis and performing one or more analysis operations for the envelope to perform verification and manufacturability checks.
1. A method comprising:
by a computer:
verifying, using a Grobner envelope, non-rectilinear features of a lithographic layout, including by:
receiving layout data representing geometric photolithographic layout features that include the non-rectilinear features, the layout data including parametric curves that represent the geometric photolithographic layout features;
creating bounding boxes for the geometric photolithographic layout features represented with the parametric curves;
determining bounding box intersections for the geometric photolithographic layout features represented with parametric curves;
combining, into a combined geometric photolithographic layout feature, the parametric curves of given geometric photolithographic layout features with respective bounding boxes that were determined to intersect;
generating envelopes for the geometric photolithographic layout features, including the combined geometric photolithographic layout feature, the envelopes being generated using Grobner basis functions of respective families of second curves around each parametric curve; and
performing verification checks with the generated envelopes to determine whether the geometric photolithographic layout features, including the non-rectilinear features, comply with one or more rules specified for a manufacturing process.
2. The method of claim 1 , further comprising using quantifier elimination (QE) to perform one or more dimensional checks for the non-rectilinear features.
3. The method of claim 1 , further comprising performing at least one or more of the following operations: singularity detection, manufacturability checking, and/or bias application.
4. The method of claim 1 , further comprising filtering second data representing the photolithographic layout, including the generated envelopes, using the bounding boxes.
5. The method of claim 1 , wherein the non-rectilinear features are all or a portion of one of the following: an optical interconnect, silicon photonic device, a micro-electronic mechanical system (MEMS), or a micro-fluidic device.
6. The method of claim 1 , wherein generating the envelopes using the Grobner basis functions is based at least in part on using Buchberger's algorithm.
7. The method of claim 1 , further comprising, subsequent to the performing the verification checks, storing verified layout data in a computer readable storage device or memory.
8. One or more computer readable storage media storing computer-readable instructions that, when executed by a computer, cause the computer to perform the method of claim 1 .
9. One or more computer-readable storage media storing computer-readable instructions that, when executed by a computer, cause the computer to:
evaluate geometric photolithographic layout features represented with parametric curves by:
creating bounding boxes for the geometric photolithographic layout features represented with the parametric curves;
determining bounding box intersections for the geometric photolithographic layout features represented with parametric curves;
combining, into a combined geometric photolithographic layout feature, the parametric curves of given geometric photolithographic layout features with respective bounding boxes that were determined to intersect;
generating envelopes for the geometric photolithographic layout features, including the combined geometric photolithographic layout feature, the envelopes being generated using Grobner basis functions of respective families of second curves around each parametric curve; and
performing dimensional checks with the generated envelopes to determine whether the geometric photolithographic layout features comply with one or more rules specified for a manufacturing process.
10. The computer-readable storage media of claim 9 , wherein the instructions for performing the dimensional checks comprise instructions for performing quantifier elimination.
11. The computer-readable storage media of claim 9 , further comprising instructions for transforming data expressed in a piecewise linear representation into the parametric curve representation.
12. The computer-readable storage media of claim 9 , wherein the instructions for performing the dimensional checks use equation-based design rules.
13. A system comprising:
one or more processors;
memory coupled to the processors; and
one or more computer readable storage media storing computer-readable instructions that when executed by the processors, cause the system to evaluate photolithographic layout objects represented with parametric curves by:
creating bounding boxes for the photolithographic layout objects represented with the parametric curves;
determining bounding box intersections for the photolithographic layout objects represented with parametric curves;
combining, into a combined photolithographic layout object, the parametric curves of given photolithographic layout objects with respective bounding boxes that were determined to intersect;
generating envelopes for the photolithographic layout objects, including the combined photolithographic layout object, the envelopes being generated using Grobner basis functions of respective families of second curves around each parametric curve; and
performing verification checks with the generated envelopes to determine whether the geometric photolithographic layout objects comply with one or more rules specified for a photolithographic process.
14. The system of claim 13 , further comprising a database coupled to the processor, the database including:
a library of parameterized cells, each of the parameterized cells being represented by one or more equations and one or more parameters describing a corresponding photolithographic layout object described by the parameterized cell; and
a set of rules for verifying that the corresponding layout object complies with one or more constraints of a photolithographic process.
15. The system of claim 13 , further comprising a mask writer, a reticle writer, or an electron beam writer configured to image a pattern for the photolithographic layout objects onto a photoresist surface.
16. The system of claim 13 , wherein the computer readable storage media further include instructions for one or more of the following tools: a layout editor, a layout verification tool, or a physical extraction tool, wherein the instructions for the tools, when executed, cause the system to analyze the photolithographic layout objects based at least in part on computing a Grobner basis for a second family of curves around a first curve defined by the equation or inequality.
17. The system of claim 13 , further comprising computer-readable storage media storing data for one or more of the following: piecewise linear data from which the equation or inequality describing the curved feature is generated, data used to generate a mask or reticle for a photolithographic process, data used to generate reticle enhancement features for the photolithographic process, or data used to generate waivers for a rectilinear-based layout verification tool.
18. The method of claim 1 , further comprising storing on computer readable storage media, subsequent to the performing the verification checks, a file comprising instructions for a mask writer or reticle manufacturing tool to manufacture a mask or reticle including the non-rectilinear feature.
19. The method of claim 7 , wherein at least one verification check indicates an error or warning, and wherein the verified layout data is stored following modification to address the error or warning.