CMP head structure with retaining ring
View Patent ↗A CMP structure for CMP processing and a method of making a device using the same are presented. The apparatus comprises a polishing pad on a platen table, a head assembly for holding a wafer against the polishing pad, wherein the head assembly includes a retaining ring, a sensor for sensing the depth of grooves on the retaining ring and a controller for determining an update pressure to apply to the retaining ring based on the depth of the grooves and applying the updated pressure to the retaining ring during processing.
1. A chemical mechanical polishing (CMP apparatus comprising:
a polishing pad on a platen table;
a head assembly, wherein the head assembly includes a retaining ring for holding a wafer in place on the polishing pad;
a sensor configured for determining a depth of grooves on the retaining ring based on a gap between a membrane of the retaining ring and a side of the retaining ring which correlates to the depth of the grooves; and
a controller configured for calculating an updated pressure to be applied to the retaining ring based on the depth of the grooves and applying the updated pressure to the retaining ring during processing of the wafer.
2. The apparatus of claim 1 wherein the controller comprises a process controller for monitoring a groove depth and controlling a pressure exerted by the retaining ring.
3. The apparatus of claim 2 , wherein the process controller receives measurement of the groove depth from the sensor in the form of a digital signal.
4. The apparatus of claim 3 wherein the process controller calculates updated pressure based on groove depth data received from the sensor and sends updated pressure data to an upper pneumatic-assembly (UPA).
5. The apparatus of claim 4 wherein the UPA supplies the updated pressure data to the head assembly.
6. The apparatus of claim 5 wherein the head assembly applies the updated pressure to the retaining ring during processing.
7. The apparatus of claim 6 wherein the updated pressure applied by the head assembly to the retaining ring during processing will become less as the depth of the grooves on the retaining ring becomes shallower.
8. The apparatus of claim 4 wherein the process controller calculates and sends a lesser updated pressure data to the UPA if the groove depth data received indicates that the groove depth has decreased.
9. The apparatus of claim 1 wherein the calculation by the controller is based on a model and the model can be monitored and revised periodically based on inline performance.
10. A chemical mechanical polishing (CMP) apparatus comprising:
a polishing pad;
a head assembly, wherein the head assembly includes a retaining ring for holding a wafer in place on the polishing pad; and
one or more sensors configured for determining a depth of grooves on the retaining ring based on a gap between a membrane of the retaining ring and a side of the retaining ring which correlates to the depth of the grooves.
11. The apparatus of claim 10 comprising a controller configured for calculating an updated pressure to be applied to the retaining ring based on the depth of the grooves and applying the updated pressure to the retaining ring during processing of the wafer.
12. The apparatus of claim 11 wherein the updated pressure applied to the retaining ring during processing will become less as the depth of the grooves on the retaining ring decreases.
13. The apparatus of claim 11 wherein the depth of the grooves on the retaining ring is determined by the one or more sensors installed at a head cup load unload (HCLU).
14. The apparatus of claim 11 wherein the controller comprises a process controller configured for monitoring a groove depth and controlling a pressure exerted by the retaining ring.
15. The apparatus of claim 14 wherein the process controller receives measurement of the groove depth from the one or more sensors in the form of a digital signal.
16. The apparatus of claim 15 wherein the process controller calculates updated pressure based on the groove depth measurement received from the one or more sensors and sends updated pressure data to an upper pneumatic assembly (UPA).
17. The apparatus of claim 16 wherein the UPA supplies the updated pressure data to the head assembly.
18. The apparatus of claim 11 wherein the calculation by the controller is based on a model and the model can be monitored and revised periodically based on inline performance.
19. The apparatus of claim 18 wherein the controller calculates and sends a lesser updated ring pressure data to an upper pneumatic assembly (UPA) if groove depth data received by the controller from the one or more sensors indicate that a groove depth has decreased.
20. The apparatus of claim 19 wherein the UPA supplies the updated pressure to the head assembly.