Charged particle beam device
View Patent ↗In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.
1. A charged particle beam device comprising:
an objective lens that focuses a charged particle beam emitted from a charged particle source;
a detector that detects a charged particle;
a first Wien filter that deflects a charged particle emitted from the sample toward the detector;
a second Wien filter that is disposed between the charged particle source and the first Wien filter and that generates chromatic dispersion for compensating chromatic dispersion of the charged particle beam generated by the first Wien filter;
a focusing element that is disposed between the first Wien filter and the second Wien filter and that includes at least one of a third Wien filter and a focusing lens; and
a control device that controls at least one of the third Wien filter and the focusing lens;
wherein the control device controls at least one of the third Wien filter and the focusing lens so that the charged particle beam dispersed by the second Wien filter is focused on a deflection fulcrum of the first Wien filter.
2. The charged particle beam device according to claim 1 , further comprising
a charged particle focusing lens that is disposed between the first Wien filter and the objective lens and that focuses a charged particle emitted from the sample onto the deflection point.
3. The charged particle beam device according to claim 1 , wherein:
the first Wien filter is disposed to deflect the charged particle, that is emitted from the sample, on an object plane of the objective lens.
4. The charged particle beam device according to claim 1 , wherein:
an inclination deflector to deflect the charged particle beam so that a charged particle beam is emitted to the sample from a direction different from an ideal optical axis of the objective lens and an aberration correction unit to correct aberration generated by deflection of the charged particle beam by the inclination deflector is disposed between the charged particle source and the object plane of the objective lens.
5. The charged particle beam device according to claim 4 , wherein:
an aberration compensation lens is disposed above the first Wien filter.
6. The charged particle beam device according to claim 1 , wherein:
the first Wien filter and the second Wien filter are disposed in an optical axis of the charged particle beam while taking an object plane of the objective lens as a symmetrical surface.
7. The charged particle beam device according to claim 1 , further comprising:
a control device that controls the first Wien filter and the second Wien filter so that a strength, a direction, and a distribution of an electromagnetic field generated by the first Wien filter and a strength, a direction, and a distribution of an electromagnetic field generated by the second Wien filter are symmetric with each other with respect to an object plane of the objective lens.