Enhanced contact electrical discharge plasma reactor for liquid and gas processing
An electrical discharge plasma reactor system for treating a liquid, a gas, and/or a suspension. The reactor system includes a reactor chamber configured to hold the liquid and a gas, a discharge electrode disposed within the gas of the reactor chamber, a non-discharge electrode disposed within the liquid, a gas diffuser disposed within the liquid and configured to induce the generation of a layer of foam on the surface of the liquid in a plasma-contact region, and a power supply connected to the discharge electrode and configured to induce the discharge electrode to generate plasma in the plasma-contact region.
1. An electrical discharge plasma reactor system for treating liquid, the reactor system comprising:
a reactor chamber configured to hold the liquid and a gas;
a discharge electrode disposed within the reactor chamber;
a non-discharge electrode disposed within the liquid;
a gas diffuser disposed within the liquid, wherein the gas diffuser is configured to induce generation of a layer of foam on a surface of the liquid in a plasma-contact region; and
a pulsed DC power supply connected to the discharge electrode, the pulsed DC power supply configured to induce the discharge electrode to generate a low-voltage plasma on the surface of the foam and/or liquid in the plasma-contact region;
wherein the non-discharge electrode is positioned in close proximity to the gas diffuser, and is independent of the walls of the reactor chamber;
wherein the discharge electrode is disposed within the reactor chamber such that the discharge electrode interfaces with the generated layer of foam in the plasma-contact region, but the discharge electrode does not enter the liquid.
2. The system of claim 1 , wherein the non-discharge electrode is a ring.
3. The system of claim 1 , wherein the non-discharge electrode comprises two or more rails disposed in the reactor chamber.
4. The system of claim 3 , wherein one of the non-discharge electrode rails are positioned on either side of the gas diffuser.
5. The system of claim 1 , further comprising a suspended weir configured to alter a circulation pattern of the liquid within the reactor chamber.
6. The system of claim 1 , wherein the gas comprises argon.
7. The system of claim 1 , further comprising a gas recycler configured to capture gas pumped through the gas diffuser into the reactor chamber, and reuse the captured gas in the same reactor chamber.
8. An electrical discharge plasma reactor system for treating a liquid, the reactor system comprising:
a reactor chamber configured to hold the liquid and a gas;
a discharge electrode disposed within the reactor chamber;
a ring-shaped non-discharge electrode disposed within the liquid;
a suspended weir configured to alter a circulation pattern of the liquid within the reactor chamber;
a gas diffuser disposed within the liquid, wherein the gas diffuser is configured to induce generation of a layer of foam on a surface of the liquid in a plasma-contact region; and
a pulsed DC power supply connected to the discharge electrode, the pulsed DC power supply configured to induce the discharge electrode to generate a low-voltage plasma on the surface of the foam and/or liquid in the plasma-contact region, the power supply configured to provide a voltage of 30 kV or less;
wherein the non-discharge electrode is positioned in close proximity to the gas diffuser, and is independent of the walls of the reactor chamber;
wherein the discharge electrode is disposed within the reactor chamber such that the discharge electrode interfaces with the generated layer of foam in the plasma-contact region, but the discharge electrode does not enter the liquid.