IP Library Granted Patent US 10,347,520
Granted Patent B2
US 10,347,520 · App. 15/021,897 · Granted Jul 9, 2019

Electrostatic chuck and method for manufacturing electrostatic chuck

Inventors: Ok Ryul Kim (Yongin-si, KR); Ok Min Kim (Yongin-si, KR)
Assignees: FEMVIX; Ok Ryul Kim; Ok Min Kim
H01L21/6833B05D1/02B05D3/0493H02N13/00H01L21/6831
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,347,520
App. No.
15/021,897
Granted
Jul 9, 2019
Kind
B2
Abstract

Provided is an electrostatic chuck including: a base material; an adsorption unit for adsorbing a wafer by using electrostatic force; an adhesive layer for adhering the adsorption unit to the base material; and an adhesive layer anti-corrosion coating layer provided to cover an exposed surface of the adhesive layer, wherein the adhesive layer anti-corrosion coating layer has no pores or cracks since the adhesive layer anti-corrosion coating layer is made by a method of spraying and coating, at conditions of 0-50° C. and a vacuum state, ceramic powder which is continuously supplied at a constant quantity to the carrier gas of which a fixed flow rate is controlled, and a method for manufacturing an electrostatic chuck, including the steps of: (a) forming an adhesive layer for adhering an adsorption unit for adsorbing a wafer to a base material by using electrostatic force; and (b) forming an adhesive layer anti-corrosion coating layer which covers an exposed surface of the adhesive layer and has no pores or cracks as it is made by a method of spraying and coating, at conditions of 0-50° C. and a vacuum state, ceramic powder which is continuously supplied at a constant quantity to the carrier gas of which a fixed flow rate is controlled.

Claims (22)

1. An electrostatic chuck comprising:

a base substrate;

an adsorption unit for adsorbing a wafer using electrostatic force;

an adhesive layer for adhering the adsorption unit to the base substrate; and

an adhesive layer erosion prevention coating layer provided to cover an exposed surface of the adhesive layer,

wherein the adhesive layer erosion prevention coating layer is formed in a method of continuously supplying a constant amount of ceramic powder to a carrier gas controlled to flow at a fixed rate, and spraying and coating the ceramic powder on the exposed surface of the adhesive layer under a condition of 0 to 50° C. in a vacuum state, wherein the ceramic powder is supplied in an environment maintaining an atmospheric pressure state.

2. The chuck according to claim 1 , wherein the adhesive layer erosion prevention coating layer is directly coated on the exposed surface of the adhesive layer.

3. The chuck according to claim 1 , wherein the adhesive layer erosion prevention coating layer is coated on an outer surface of a covering wrapping and combined with the exposed surface of the adhesive layer.

4. The chuck according to claim 1 , wherein the base substrate is formed of a metal, a polymer or a ceramic.

5. The chuck according to claim 1 , wherein the adsorption unit is formed of a ceramic sheet or an insulating resin sheet.

6. The chuck according to claim 1 , wherein the adhesive layer is formed of an adhesive including thermoplastic resin or thermosetting resin.

7. The chuck according to claim 1 , wherein the adhesive layer erosion prevention coating layer is a ceramic coating layer formed of one or more of Y 2 O 3 , YF 3 , Al 2 O 3 , AlN, SiC, TiO 2 , and YAG.

8. The chuck according to claim 1 , further comprising an adsorption unit erosion prevention coating layer formed by spraying and coating ceramic powder, wherein a constant amount of the ceramic powder is continuously supplied to a carrier gas, which is controlled to flow at a fixed rate, to be coated on an exposed surface of the adsorption unit under a condition of 0 to 50° C. in a vacuum state.

9. The chuck according to claim 8 , wherein the adsorption unit erosion prevention coating layer is a ceramic coating layer formed of one or more of Y 2 O 3 , YF 3 , Al 2 O 3 , AlN, SiC, TiO 2 , and YAG.

10. A method of manufacturing an electrostatic chuck, the method comprising the steps of:

(a) preparing an adsorption unit for adsorbing a wafer using electrostatic force and disposing an adhesive layer for adhering the adsorption unit to a base substrate, and

(b) providing an adhesive layer erosion prevention coating layer covering an exposed surface of the adhesive layer in a method of continuously supplying a constant amount of ceramic powder to a carrier gas controlled to flow at a fixed rate, and spraying and coating the ceramic powder on the exposed surface of the adhesive layer under a condition of 0 to 50° C. in a vacuum state, wherein the ceramic powder is supplied in an environment maintaining an atmospheric pressure state.

11. The method according to claim 10 , wherein in the step (b), the adhesive layer erosion prevention coating layer is formed in a method of directly spraying and coating the ceramic powder on the exposed surface of the adhesive layer.

12. The method according to claim 10 , wherein the step (b) comprises preparing a covering to wrap the exposed surface of the adhesive layer and disposing the adhesive layer erosion prevention coating layer on an outer surface of the covering.

13. The method according to claim 10 , wherein a supply amount of the ceramic powder is 0.1 to 100 g/min, and its deviation is smaller than ±1 wt %.

14. The method according to claim 10 , wherein a flow amount of the carrier gas is 5 to 500 m 3 /min, and its deviation is smaller than ±1 vol %.

15. The method according to claim 10 , further comprising the step of forming an adsorption unit erosion prevention coating layer by continuously supplying a constant amount of the ceramic powder to a carrier gas controlled to flow at a fixed rate, and spraying and coating the ceramic powder on an exposed surface of the adsorption unit under a condition of 0 to 50° C. in a vacuum state.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2016
From: KIM, OK RYUL; KIM, OK MIN
To: FEMVIX CORP.; KIM, OK RYUL; KIM, OK MIN
Reel/Frame 037969/0788 →
Priority Claims (1)
KR 10-2013-0110964 · Sep 16, 2013 · national
Continuity (1)
Related Publication 20160233121A1 · Aug 11, 2016