Scanning probe nanolithography system and method

1. A scanning probe nanolithography system for writing nanostructures along write lines on a sample, comprising:

a probe to create the nanostructures line by line through writing said nanostructures pixel by pixel along lines on a sample;

an XYZ positioning system, with an XY portion adapted to provide a positioning of the probe at a sequence of predetermined positions along write lines to the sample and with a Z portion to position the probe with its surface towards the sample;

a writing unit comprising a write/actuation mechanism of the probe for the pixel-wise creation of the nanostructures along write lines;

a control unit adapted to control the XY portion of the XYZ positioning system for positioning a read line that follows a write line in a constant distance in parallel at or between positions of earlier write lines; and

a sensor unit adapted to detect a predetermined property of the written nanostructure on the sample pixel by pixel of the read line that was read,

wherein the sensor unit is connected to the control unit to adjust control signals, wherein the control signals are provided to the writing unit for writing a next write line, wherein the control signals are based on the measured signals of the predetermined property of the read line, wherein the predetermined property is selected from the group of physical properties consisting of friction, thermal conductivity, electrical conductivity, electrostatic potential, magnetic moment, adhesion, elastic modulus, and topography.

2. The scanning probe nanolithography system according to claim 1 , wherein the constant distance is zero or a multiple of the distance between write lines.

3. The scanning probe nanolithography system according to claim 1 , wherein the probe and the positioning system are connected via a cantilever and the predetermined property is measured by measuring the deflection of the cantilever using laser deflection or interferometry.

4. The scanning probe nanolithography system according to claim 3 , wherein the sensor unit comprises a thermal sensor or a piezoresistive sensor integrated into the cantilever.

5. The scanning probe nanolithography system according to claim 1 , wherein the sensor unit comprises the probe itself.

6. The scanning probe nanolithography system according to claim 1 , wherein the positioning system comprises piezo stages or magnetic voice-coil stages.

7. The scanning probe nanolithography system according to claim 1 , wherein the XY portion of the XYZ positioning system is a xy-piezo 2D displacement unit and the Z portion of the XYZ positioning system is a z-piezo displacement unit.

8. The scanning probe nanolithography system according to claim 1 , wherein the control unit is adapted to restrict writing and reading of lines to a central area of the sample.

9. The scanning probe nanolithography system according to claim 1 , wherein the write/actuation mechanism to create the nanostructure uses a heated tip to deposit material from the tip to the sample or to bring the tip into mechanical contact with the sample.

10. The scanning probe nanolithography system according to claim 3 , wherein the write/actuation mechanism to create the nanostructure uses an electric field between the cantilever and the sample.

11. The scanning probe nanolithography system according to claim 1 , wherein the control unit is adapted to use a signal from the sensor unit to determine the distance between the tip and the sample surface and to use the acquired data from the sensor unit to adapt the control signals to be provided to the XYZ positioning system and consequently control the distance at all positions XY by adjusting the Z position motion.

12. The scanning probe nanolithography system according to claim 1 , wherein the information of the measured property of the written nanostructure is used to adjust the Z positioning motion for the tip to be positioned at a predetermined height for reading the said written nanostructure.

13. A scanning probe nanolithography writing method using a scanning probe nanolithography system for writing nanostructures along lines on a sample, comprising a probe to create the nanostructures line by line through writing said nanostructures pixel by pixel along lines on a sample; a positioning system, adapted to provide a positioning of the probe at a sequence of predetermined positions to the sample and its surface towards the probe; a writing unit comprising a write/actuation mechanism for the pixel-wise creation of the nanostructures in write lines; a control unit adapted to control the positioning system for positioning the probe for the pixel-wise writing of said write lines through the writing unit, a sensor unit adapted to detect a predetermined property of the written nanostructure pixel by pixel in a read line, wherein the sensor unit is connected to the control unit to adjust the control signals, wherein the control signals are based on the measured signals of the predetermined property and are provided to the writing unit for writing a next line, comprising the steps of:

displacing the probe along a write line to create nanostructures pixel by pixel along the write line on the sample through the writing unit;

repositioning the probe along a reading line parallel to the write line through the positioning system after each write line;

measuring a predetermined property of the written nanostructure of a read line through the sensor unit; and

calculating control signals to be provided to the writing unit for writing the next line through the control unit by using the acquired data signals from the sensor unit.

14. The scanning probe nanolithography writing method according to claim 13 , wherein the control unit controls a XY portion of the positioning system to position the read line that follows the write line in a constant distance in parallel at or between positions of earlier write lines.

15. The scanning probe nanolithography writing method according to claim 14 , wherein the constant distance is zero or a multiple of the distance between write lines.

16. The scanning probe nanolithography system according to claim 1 , wherein the write/actuation mechanism to create the nanostructure uses an electric field between the tip and the sample to deposit material from the tip to the sample or to bring the tip into mechanical contact with the sample.