Exposure apparatus and exposure method
View Patent ↗Complex and fine patterns may be formed by an exposure apparatus that decreases movement error of a stage including a beam generating section that generates a charged particle beam, a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section, a detecting section that detects a position of the stage section, a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section, and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount.
1. An exposure apparatus comprising:
a beam generator that generates a plurality of charged particle beams having different irradiation positions in a width direction of a line pattern on a sample;
a blanking electrode to selectively irradiate the sample at designated irradiation positions in a longitudinal direction on the line pattern;
a stage adapted to have a sample mounted thereon and move the sample relative to the plurality of charged particle beams;
a detector that detects a position of the stage; and
a plurality of deflectors to separately deflect the plurality of charged particle beams.
2. The exposure apparatus according to claim 1 , wherein:
the plurality of deflectors are adapted and arranged to deflect the plurality of charged particle beams based on a difference between the detected position of the stage and a predicted position of the stage corresponding to a predicted drive amount.
3. The exposure apparatus according to claim 2 , wherein
the predicted drive amount is based on an average movement velocity from a plurality of detected positions of the stage, and time that has passed from when the detector detects the position of the stage.
4. The exposure apparatus according to claim 3 , wherein
the detector is adapted and arranged to sequentially detect positions of the stage, and
the average movement velocity from the plurality of detected positions of the stage is sequentially calculated and updated.
5. The exposure apparatus according to claim 2 , wherein
the plurality of deflectors separately deflect the plurality of charged particle beams based on a component obtained by decreasing a frequency component that is less than a predetermined frequency in a difference between the predicted position of the stage and the detected position of the stage.
6. The exposure apparatus according to claim 2 , wherein
the stage adjusts movement of the sample based on a detected position that is based on a detection signal obtained by decreasing a component that is greater than or equal to a predetermined frequency in the detection signal to detect the position of the stage.
7. The exposure apparatus according to claim 2 , wherein
the plurality of deflectors separately deflect the plurality of charged particle beams based on a difference between the predicted position of the stage and the detected position of the stage and on a movement position of the sample corresponding to a predetermined delay time.
8. The exposure apparatus according to claim 1 , wherein
the beam generator generates the plurality of charged particle beams having different irradiation positions in a width direction of a line pattern on the sample,
the stage scans irradiation positions of the plurality of charged particle beams along a longitudinal direction of the line pattern, and
the blanking electrode is further configured to select at least one charged particle beams to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern, and to control the selected at least one charged particle beam to irradiate the sample.
9. An exposure method for irradiating a sample with a charged particle beam, comprising:
generating, with a beam generating section, the charged particle beam;
moving, with a stage section that has a sample mounted thereon, the sample relative to the beam generating section;
detecting a position of the stage section;
generating a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section;
performing irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount, including controlling a time during which the sample is irradiated with the charged particle beam, such that an exposure amount distribution draws near a predetermined target for the exposure amount distribution, and
deflecting the charged particle beam based on a difference between the detected position of the stage section and a predicted position of the stage section corresponding to the predicted drive amount.
10. An exposure method for irradiating a sample with a charged particle beam, comprising:
generating, with a beam generating section, the charged particle beam;
moving, with a stage section that has a sample mounted thereon, the sample relative to the beam generating section;
detecting a position of the stage section;
generating a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and
performing irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount, wherein
the performing irradiation control includes controlling an irradiation amount of the charged particle beam based on a difference between a movement velocity of the stage section and a predicted movement velocity of the stage section.