Method for manufacturing a transistor

1. Method for manufacturing a transistor, the method comprising:

arranging a stack on a semiconductor substrate, the stack comprising a sacrificial layer and an insulator layer; the insulator layer at least partially being arranged between the semiconductor substrate and the sacrificial layer, wherein a recess is formed within the stack, wherein the recess extends through the stack to the semiconductor substrate, so that the recess at least partially overlaps with a collector region of the semiconductor substrate, and wherein the collector region extends from a main surface of the semiconductor substrate into a substrate material of the semiconductor substrate;

generating a base structure at the collector region and in the recess, wherein the base structure contacts and covers the collector region within the recess of the sacrificial layer;

generating an emitter structure at the base structure, wherein the emitter structure contacts and at least partially covers the base structure within the recess of the sacrificial layer;

removing the sacrificial layer at least partially such that a lateral surface region of the base structure is exposed; and

generating a doped electrode layer by epitaxially growing a semiconductor material to the exposed lateral surface region of the base structure, such that the doped electrode layer connects the lateral surface region of the base structure.

2. The method according to claim 1 , wherein, during generating the doped electrode layer, the doped electrode layer is grown monocrystalline at the base structure in a lateral direction perpendicular to a surface normal of the semiconductor substrate.

3. The method according to claim 1 , wherein, during generating the base structure, the base structure is deposited extensively in the recess such that the base structure is aligned with respect to the collector region and with respect to the recess.

4. The method according to claim 1 , further comprising:

generating a spacer structure at the base structure and in the recess at a main surface region of the base structure and before the emitter structure is generated;

wherein the emitter structure is generated in the recess at a portion of the main surface region of the base structure uncovered by the spacer structure.

5. The method according to claim 4 , further comprising:

arranging an insulator material at the emitter structure such that the emitter structure is encapsulated by the insulator material, the spacer structure and the base structure.

6. The method according to claim 1 , wherein the stack further comprises an electrode seed layer arranged between the insulator layer and the sacrificial layer, wherein the insulator layer is arranged between the semiconductor substrate and the electrode seed layer, and wherein the sacrificial layer spaces the electrode seed layer from the recess;

wherein, during removing the sacrificial layer, a surface region of the electrode seed layer is exposed; and

wherein, during generating the doped electrode layer, the semiconductor material is grown to the exposed surface region of the electrode seed layer, such that the doped electrode layer connects the exposed lateral surface region of the base structure and the surface region of the electrode seed layer.

7. The method according to claim 6 , wherein, during generating the doped electrode layer, the doped electrode layer is grown amorphous or polycrystalline at the electrode seed layer along a thickness direction parallel to a direction of a normal of the main surface.

8. The method according to claim 1 , wherein arranging the stack comprises:

providing the semiconductor substrate;

arranging the insulator layer at the semiconductor substrate;

arranging an electrode seed layer at the insulator layer;

arranging the sacrificial layer at the electrode seed layer;

removing the sacrificial layer and the electrode seed layer in a separating region exceeding a region of the recess; and

re-arranging the sacrificial layer in the separating region such that the recess is formed and such that the electrode seed layer is separated from the recess by the re-arranged sacrificial layer.

9. The method according to claim 8 , wherein during arranging the electrode seed layer, the electrode seed layer is arranged by depositing an amorphous silicon material or a polysilicon material at the insulator layer.

10. The method according to claim 8 , wherein, during removing the electrode seed layer, the electrode seed layer is removed such that a distance between the recess and the electrode seed layer of at least 5 nm and at most 100 nm is obtained.

11. The method according to claim 1 , wherein arranging the stack comprises:

generating the collector region in the recess and in the semiconductor substrate by implantation, wherein the implantation is performed through the insulator layer.

12. The method according to claim 1 , wherein arranging the stack further comprises arranging the sacrificial layer by depositing a silicon nitride material at the insulator layer or at an electrode seed layer.

13. The method according to claim 1 , wherein arranging the stack further comprises arranging the insulator layer such that a thickness of the insulator layer of at least 15 nm and at most 200 nm along a thickness direction parallel to a direction of a normal of the main surface of the semiconductor substrate is obtained.

14. The method according to claim 1 , wherein, during generating the base structure, the base structure is grown such that a thickness of the base structure of at least 40 nm and at most 50 nm along a thickness direction parallel to a direction of a normal of the main surface of the semiconductor substrate is obtained.

15. The method according to claim 1 , wherein, during generating the doped electrode layer, the doped electrode layer is generated by epitaxially growing using a silicon material and a boron material.

16. The method according to claim 1 , wherein generating the doped electrode layer is performed without a temperature annealing.