Flow control system, method, and apparatus
View Patent ↗In one embodiment, a control apparatus for delivery of a process gas includes an inlet conduit; a valve operably coupled to the inlet conduit and alterable between an open condition and a closed condition, the valve having a first conductance and being downstream of the inlet conduit; a characterized restrictor operably coupled to the valve, the characterized restrictor having a second conductance and being downstream of the valve; and an outlet conduit operably coupled to the characterized restrictor and being downstream of the characterized restrictor; wherein a ratio of the first conductance to the second conductance is 10:1 or higher.
1. A control apparatus for delivery of a process gas, comprising:
a substrate block comprising an inlet conduit and an outlet conduit;
a valve operably coupled to the substrate block, the valve comprising a valve body, a valve seat, and a poppet assembly, the valve fluidly coupled to the inlet conduit and alterable between an open condition and a closed condition, the valve being downstream of the inlet conduit;
a characterized restrictor located within the valve body and fluidly coupled to the valve; and
a proportional valve fluidly coupled to the inlet conduit and positioned between the inlet conduit and the valve;
wherein the outlet conduit is fluidly coupled to the valve and downstream of the valve such that the proportional valve and the valve are arranged in series with the inlet conduit and the outlet conduit; and
wherein the control apparatus is configured to deliver a desired flow rate to the outlet conduit.
2. The control apparatus according to claim 1 wherein, in the closed condition, a volume exists between the valve seat and the characterized restrictor, the volume being 0.02 cc or less.
3. The control apparatus according to claim 1 wherein the valve is an on-off valve.
4. The control apparatus according to claim 1 further comprising a pressure measurement device configured to measure a pressure of the process gas upstream of the characterized restrictor.
5. The control apparatus according to claim 1 wherein the control apparatus is free of any device between the characterized restrictor and the valve seat.
6. The control apparatus according to claim 1 , wherein the characterized restrictor is downstream of the valve.
7. The control apparatus according to claim 1 wherein the control apparatus is free of any device between the valve and the outlet conduit.
8. The control apparatus according to claim 1 wherein the valve seat is upstream of the characterized restrictor.
9. The control apparatus according to claim 1 wherein the characterized restrictor is upstream of the valve seat.
10. The control apparatus according to claim 1 wherein the proportional valve has a variable restriction that is configured to be controlled by an amplitude modulated signal.
11. The control apparatus according to claim 1 wherein the proportional valve has a valve body.
12. The control apparatus according to claim 11 wherein the valve body of the proportional valve is separately formed from the substrate block and the valve body of the valve.
13. A control apparatus for delivery of a process gas, comprising:
a substrate block comprising an inlet conduit and an outlet conduit;
a proportional valve fluidly coupled to the inlet conduit, the proportional valve comprising a first valve body, a valve seat, and a closure member, the proportional valve configured to provide a variable restriction across the valve seat and the closure member, and the proportional valve being downstream of the inlet conduit;
an on-off valve fluidly coupled to the inlet conduit and alterable between an open condition and a closed condition, the on-off valve having a second valve body, a valve seat, and a closure member, the on-off valve being downstream of the proportional valve;
a characterized restrictor fluidly coupled to the second valve and located within the second valve body; and
wherein the outlet conduit is fluidly coupled to the characterized restrictor and downstream of the characterized restrictor.
14. The control apparatus according to claim 13 wherein the closure member of the proportional valve is configured to vary its position relative to the valve seat of the proportional valve in response to an amplitude of a control signal.
15. The control apparatus according to claim 14 wherein the closure member of the on-off valve is configured to be controlled by a pulse width modulated signal.
16. The control apparatus according to claim 13 further comprising a pressure transducer, the pressure transducer mounted to the first valve body.
17. The control apparatus according to claim 13 wherein the variable restriction of the proportional valve is configured to be controlled by an amplitude modulated signal.
18. A control apparatus for delivery of a process gas, comprising: a substrate block comprising an inlet conduit and an outlet conduit; a proportional valve having a first valve body operably coupled to the substrate block and fluidly connected to the inlet conduit; a valve having a second valve body operably coupled to the substrate block, the valve fluidly coupled to the proportional valve, the valve being downstream of the inlet conduit and the proportional valve; a characterized restrictor located within the second valve body and fluidly coupled to the valve; and wherein the outlet conduit is fluidly coupled to the valve and downstream of the valve.
19. The control apparatus according to claim 18 wherein the valve has a first conductance and the characterized restrictor has a second conductance, wherein the ratio of the first conductance to the second conductance is 10:1 or higher.