Methods of forming a nanostructured polymer material including block copolymer materials
View Patent ↗Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
1. A method of forming a nanostructured polymer material, comprising:
thermally annealing a block copolymer material in contact with a non-preferentially wetting material to cause polymer blocks of the block copolymer material to phase separate and form a self-assembled block copolymer material within a trench, the non-preferentially wetting material over the block copolymer material.
2. The method of claim 1 , wherein thermally annealing a block copolymer material in contact with a non-preferentially wetting material comprises:
zone heating a first section of a block copolymer material to cause the first section to phase separate and self-assemble, and then subsequently heating remaining sections of the block copolymer material to cause the remaining sections to phase separate and self-assemble.
3. The method of claim 1 , further comprising removing the non-preferentially wetting material to expose the self-assembled block copolymer material within the trench.
4. The method of claim 3 , further comprising applying a solvent to the non-preferentially wetting material to enhance removal.
5. The method of claim 1 , wherein thermally annealing a block copolymer material in contact with a non-preferentially wetting material comprises thermally annealing the block copolymer material in contact with a non-preferentially wetting solid material.
6. The method of claim 1 , wherein thermally annealing a block copolymer material in contact with a non-preferentially wetting material comprises thermally annealing the block copolymer material in contact with an elastomeric material.
7. The method of claim 1 , wherein thermally annealing a block copolymer material in contact with a non-preferentially wetting material comprises thermally annealing the block copolymer material in contact with a poly(dimethylsiloxane) elastomer, a silicone, or a poly(urethane).
8. The method of claim 1 , wherein thermally annealing a block copolymer material in contact with a non-preferentially wetting material comprises thermally annealing the block copolymer material in contact with a solid elastomeric material.
9. A method of forming a nanostructured material, comprising:
thermally annealing a block copolymer material in contact with a non-preferentially wetting solid material to cause polymer blocks of the block copolymer material to phase separate and form a self-assembled block copolymer material within a trench in a first material overlying a second material;
removing the non-preferentially wetting solid material to expose the self-assembled block copolymer material;
crosslinking a first block of the self-assembled block copolymer material;
removing a second block of the self-assembled block copolymer material to form openings extending through the self-assembled block copolymer material; and
removing at least a portion of the second material through the openings to form openings in the second material.
10. The method of claim 9 , wherein thermally annealing a block copolymer material in contact with a non-preferentially wetting solid material to cause polymer blocks of the block copolymer material to phase separate and form a self-assembled block copolymer material comprises forming the self-assembled block copolymer material comprising cylindrical domains of a first polymer block in a matrix of a second polymer block.
11. The method of claim 9 , wherein removing at least a portion of the second material through the openings comprises etching portions of the second material through the openings.
12. The method of claim 9 , further comprising forming a metal or metal alloy in the openings in the second material.
13. The method of claim 9 , further comprising removing the crosslinked first block of the self-assembled block copolymer material.
14. A method of forming a nanostructured polymer material, comprising:
applying a non-preferentially wetting material to a top surface of a block copolymer material, the block copolymer material within trenches in a first material on a second material; and
thermally annealing the block copolymer material to form a self-assembled block copolymer material within the trenches.
15. The method of claim 14 , wherein applying a non-preferentially wetting material to a surface of a block copolymer material comprises applying the non-preferentially wetting material to the surface of a block copolymer material comprising cylindrical domains of a first block of the block copolymer material within a matrix of a second block of the block copolymer material.
16. The method of claim 15 , wherein thermally annealing the block copolymer material to form a self-assembled block copolymer material within the trenches comprises forming the cylindrical domains perpendicular to a floor of the trenches and extending through a thickness of the self-assembled block copolymer material in a single array for the length of the trenches.
17. The method of claim 14 , wherein applying a non-preferentially wetting material to a surface of a block copolymer material comprises applying a wetting material that is non-preferential to any block of the block copolymer material.