Apparatus for GHz rate high duty cycle pulsing and manipulation of low and medium energy DC electron beams
An ElectroMagnetic-Mechanical Pulser can generate electron pulses at rates up to 50 GHz, energies up to 1 MeV, duty cycles up to 10%, and pulse widths between 100 fs and 10 ps. A modulating Transverse Deflecting Cavity (“TDC”) imposes a transverse modulation on a continuous electron beam, which is then chopped into pulses by an adjustable Chopping Collimating Aperture. Pulse dispersion due to the modulating TDC is minimized by a suppressing section comprising a plurality of additional TDC's and/or magnetic quadrupoles. In embodiments the suppression section includes a magnetic quadrupole and a TDC followed by four additional magnetic quadrupoles. The TDC's can be single-cell or triple-cell. A fundamental frequency of at least one TDC can be tuned by literally or virtually adjusting its volume. TDC's can be filled with vacuum, air, or a dielectric or ferroelectric material. Embodiments are easily switchable between passive, continuous mode and active pulsed mode.
1. A combined ElectroMagnetic-Mechanical Pulser (“EMMP”) comprising:
an input configured to accept input of a continuous electron beam;
a first Transverse Deflecting Cavity (“TDC”) downstream of the input and configured to impose an oscillatory transverse deflection on the electron beam according to at least one of a time-varying electric field and a time-varying magnetic field generated within the first TDC;
a Chopping Collimating Aperture (“CCA”) downstream of the first TDC and configured to block the electron beam when its deflection exceeds a threshold maximum or minimum, thereby chopping the electron beam into a stream of electron pulses having an electron pulse repetition rate;
a dispersion suppressing section downstream of the CCA and configured to suppress a residual dispersion of the stream of electron pulses arising from the deflection imposed by the first TDC, the dispersion suppressing section including at least two elements selected from the group comprising TDC's and magnetic quadrupoles; and
an output downstream of the dispersion suppressing section and configured to allow the stream of electron pulses to emerge from the EMMP.
2. The EMMP of claim 1 , wherein the EMMP is able to produce streams of electron pulses having electron pulse repetition rates up to 50 GHz combined with pulse lengths in the range 100 fs to 10 ps, electron energies up to 1 MeV and duty cycles up to 10%.
3. The EMMP of claim 2 , wherein the EMMP is able to produce streams of electron pulses having pulse repetition rates as low as 100 MHz.
4. The EMMP of claim 1 , wherein the EMPP can be switched between an active mode that chops the electron beam and a passive mode that passes the electron beam through the EMMP without alteration.
5. The EMMP of claim 1 , wherein the first TDC is a single-cell TDC.
6. The EMMP of claim 1 , wherein the first TDC is a three-cell TDC.
7. The EMMP of claim 1 , wherein at least one of the TDC's is empty or vacuum-filled.
8. The EMMP of claim 1 , wherein at least one of the TDC's is a filled TDC that is at least partially filled with an axially symmetric dielectric material having permittivity greater than 1.
9. The EMMP of claim 1 , wherein at least one of the TDC's is a filled TDC that is at least partially filled with an axially symmetric ferroelectric material having permittivity greater than 1.
10. The EMMP of claim 9 , wherein a fundamental frequency of the filled TDC can be controlled by changing the permittivity of the ferroelectric material by at least one of adjusting its temperature and applying a dc electric potential difference across the ferroelectric material.
11. The EMMP of claim 1 , wherein at least one TDC in the dispersion suppression section is a three-cell TDC.
12. The EMMP of claim 1 , wherein a fundamental frequency of at least one TDC included in the EMMP can be tuned by adjusting a volume of the TDC.
13. The EMPP of claim 1 , wherein the electron pulse repetition rate can be changed by replacing the first TDC with a replacement TDC having a primary resonance frequency that differs from the first TDC.
14. The EMMP of claim 1 , wherein a fundamental frequency of the first TDC can be tuned by adjusting a volume of the first TDC, thereby adjusting the electron pulse repetition rate of the EMMP.
15. The EMMP of claim 1 , wherein the dispersion suppressing section includes a second TDC and a third TDC.
16. The EMMP of claim 1 , wherein the dispersion suppressing section includes a magnetic quadrupole followed by a second TDC.
17. The EMMP of claim 1 , wherein the dispersion suppressing section includes two magnetic quadrupoles with a second TDC sandwiched in between them.
18. The EMMP of claim 1 , wherein the dispersion suppressing section includes a first magnetic quadrupole and a second TDC, followed by four additional magnetic quadrupoles.
19. The EMPP of claim 1 , wherein all TDC's included in the dispersion suppressing section are identical to the first TDC.
20. A device for producing a stream of electron pulses, the device comprising:
a continuous electron beam generator, configured to emit a continuous electron beam;
a first Transverse Deflecting Cavity (“TDC”) downstream of the continuous electron beam generator and configured to impose an oscillatory transverse deflection on the electron beam according to at least one of a time-varying electric field and a time-varying magnetic field generated within the first TDC;
a Chopping Collimating Aperture (“CCA”) downstream of the first TDC and configured to block the electron beam when its deflection exceeds a threshold maximum or minimum, thereby chopping the electron beam into a stream of electron pulses having an electron pulse repetition rate;
a dispersion suppressing section downstream of the CCA and configured to suppress a residual dispersion of the stream of electron pulses arising from the deflection imposed by the first TDC, the dispersion suppressing section including at least two elements selected from the group comprising TDC's and magnetic quadrupoles; and
an output downstream of the dispersion suppressing section and configured to allow the stream of electron pulses to emerge from the EMMP.