Formation fluid analysis tool comprising an integrated computational element and an optical filter
An example formation fluid analysis tool includes an optical element and a detector configured to receive light passed through the optical element. The optical element is configured to receive light from a fluid sample and comprises a substrate, an integrated computational element (ICE) fabricated on a first side of the substrate, and an optical filter fabricated on a second side of the substrate opposite the first side.
1. A formation fluid analysis tool, comprising:
an optical element configured to receive light from a fluid sample, the optical element comprising:
a substrate;
an integrated computational element (ICE) fabricated on a first side of the substrate; and
an optical filter fabricated on a second side of the substrate opposite the first side, wherein the optical filter transmits only a portion of a spectral range of light, and wherein fabricating the ICE and the optical filter on the substrate increases at least one of accuracy and sensitivity of the optical element; and
a detector configured to receive light passed through the optical element.
2. The formation fluid analysis tool of claim 1 , wherein the ICE was fabricated using at least one of vacuum deposition, magnetron sputtering, atomic layer deposition, or chemical vapor deposition.
3. The formation fluid analysis tool of claim 1 , wherein the optical filter was fabricated using at least one of vacuum deposition, magnetron sputtering, atomic layer deposition, or chemical vapor deposition.
4. The formation fluid analysis tool of claim 1 , wherein the optical filter is composed of alternating layers of materials with different optical characteristics.
5. The formation fluid analysis tool of claim 1 , wherein the ICE is composed of Niobium Pentoxide and Niobium.
6. The formation fluid analysis tool of claim 1 , wherein the optical filter is composed of Silicon and quartz.
7. The formation fluid analysis tool of claim 1 , wherein the optical filter comprises at least one of: a band pass filter, a short pass filter, and a long pass filter.
8. The formation fluid analysis tool of claim 1 , wherein the substrate is composed of at least one of: glass, silicon, and germanium.
9. An optical element, comprising:
a substrate;
an integrated computational element (ICE) fabricated upon a first side of the substrate; and
an optical filter fabricated upon a second side of the substrate opposite the first side, wherein the optical filter transmits only a portion of a spectral range of light, and wherein fabrication of the ICE and the optical filter on the substrate increases at least one of accuracy and sensitivity of the optical element.
10. The optical element of claim 9 , wherein the ICE was fabricated using at least one of vacuum deposition, magnetron sputtering, atomic layer deposition, or chemical vapor deposition.
11. The optical element of claim 9 , wherein the optical filter was fabricated using at least one of vacuum deposition, magnetron sputtering, atomic layer deposition, or chemical vapor deposition.
12. The optical element of claim 9 , wherein the optical filter is composed of alternating layers of materials with different optical characteristics.
13. The optical element of claim 9 , wherein the ICE is composed of Niobium Pentoxide and Niobium.
14. The optical element of claim 9 , wherein the optical filter is composed of Silicon and quartz.
15. The optical element of claim 9 , wherein the optical filter comprises at least one of: a band pass filter, a short pass filter, and a long pass filter.
16. The optical element of claim 9 , wherein the substrate is composed of at least one of: glass, silicon, and germanium.
17. A method, comprising:
fabricating an integrated computational element (ICE) of an optical element of a formation fluid analysis tool upon a first side of a substrate; and
fabricating an optical filter of the optical element upon a second side of the substrate opposite the first side, wherein the optical filter transmits only a portion of a spectral range of light, and wherein fabrication of the ICE and the optical filter upon the substrate increases as least one of accuracy and sensitivity of the optical element.
18. The method of claim 17 , wherein the ICE is fabricated upon the first side of the substrate using at least one of vacuum deposition, magnetron sputtering, atomic layer deposition, or chemical vapor deposition.
19. The method of claim 17 , wherein the optical filter is fabricated upon the second side of the substrate using at least one of vacuum deposition, magnetron sputtering, atomic layer deposition, or chemical vapor deposition.
20. The method of claim 17 , wherein the optical filter is fabricated upon the second side of the substrate by depositing alternating layers of high- and low-refractive index materials.
21. The method of claim 17 , wherein the ICE is composed of Niobium Pentoxide and Niobium.
22. The method of claim 17 , wherein the optical filter is composed of Silicon and quartz.
23. The method of claim 17 , wherein the optical filter comprises at least one of: a band pass filter, a short pass filter, and a long pass filter.
24. The method of claim 17 , wherein the substrate is composed of at least one of: glass, silicon, and germanium.