Simultaneous on-site production of hydrogen peroxide and nitrogen oxides from air and water in a low power flowing liquid film plasma discharge for use in agriculture
View Patent ↗A reactor system that includes a single reactor or a plurality of parallel reactors. A method that includes injecting a mixture including liquid water and a gas, into at least one electrically-conductive inlet capillary tube of a continuously-flowing plasma reactor to generate a flowing liquid film region on one or more internal walls of the continuously-flowing plasma reactor with a gas stream flowing through the flowing liquid film region; propagating a plasma discharge along the flowing liquid film region from at least one electrically-conductive inlet capillary to an electrically-conductive outlet capillary tube at an opposing end of the continuously-flowing plasma reactor; dissociating the liquid water in the plasma discharge to form a plurality of dissociation products; producing hydrogen peroxide and nitrogen oxides from the plurality of dissociation products.
1. A reactor system comprising:
a liquid source;
a gas source;
a casing having a plurality of internal cavities; and
a plurality of reactor assemblies arranged in parallel, wherein each of the plurality of reactor assemblies comprises:
at least one electrically-conductive inlet capillary having an inlet capillary body extending between a fluid-receiving tip and a fluid-injecting tip, wherein the fluid-receiving tip is positioned outside one of the plurality of internal cavities, and wherein the fluid-injecting tip is positioned inside one of the plurality of internal cavities, and wherein the fluid-receiving tip of the inlet capillary is fluidly connected to the liquid source and the gas source to receive a liquid and a gas;
at least one electrically-conductive outlet capillary having an outlet capillary body extending between a fluid-collecting tip and a fluid-ejecting tip, wherein the fluid-collecting tip is positioned inside one of the plurality of internal cavities, and wherein the fluid-ejecting tip is positioned outside one of the plurality of internal cavities,
wherein the inlet capillary, the outlet capillary, and the internal cavity are configured to generate a flowing liquid film region on an internal wall of one of the plurality of internal cavities and a gas stream flowing through the flowing liquid film region, when the liquid and the gas are injected into the internal cavity via the at least one electrically conductive inlet capillary, and
wherein the inlet capillary, the outlet capillary, and the internal cavity are configured to propagate a plasma discharge along the flowing liquid film region between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary.
2. The reactor system according to claim 1 , further comprising a power source, supplying a voltage across the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary.
3. The reactor according to claim 2 , wherein the power source is adapted to provide a pulsed current between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary.
4. The reactor system according to claim 2 , wherein the power source is adapted to provide a D.C. current between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary.
5. The reactor system according to claim 2 , wherein the power source is adapted to provide an A.C. current between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary.
6. The reactor system according to claim 2 , wherein a gap separates the fluid-injecting tip and the fluid-collecting tip, wherein the gap has a length, and wherein a ratio of the voltage to the length is at least about 2.5×10 5 V/m.
7. The reactor system according to claim 1 , wherein the fluid injecting tip is aligned with the fluid collecting tip.
8. The reactor system according to claim 1 , wherein the casing is optically transparent and wherein the reactor system further comprises an imaging apparatus disposed adjacent to the casing and adapted to capture imaging information of the flowing liquid film region.
9. The reactor system according to claim 1 , wherein the casing comprises fused quartz.