IP Library Granted Patent US 10,336,052
Granted Patent B2
US 10,336,052 · App. 15/125,589 · Granted Jul 2, 2019

Photocurable resin composition for forming support regions

Inventors: Jan-Michael Stepper (Bottighofen, CH); Tsuneo Hagiwara (Tokyo, JP)
Assignee: ISQUARED GmbH
B33Y40/00B29C64/112B29C64/40B33Y10/00B33Y70/00C08F2/48C08F220/28C08F220/36C08F220/58C08L33/14B29C64/124C08F2500/17C08F2800/20C08L2312/06
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Quick Facts
Patent No.
US 10,336,052
App. No.
15/125,589
Granted
Jul 2, 2019
Kind
B2
Abstract

A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.

Claims (12)

1. A photocurable resin composition for use in forming support regions when producing a photochemically fabricated 3D object by an inkjet method using a photocurable resin composition, wherein the photocurable resin composition, for forming said support regions, comprising, in proportions based on a total mass of the photocurable resin composition for forming said support regions each one of:

(A) from 2 to 20 mass % of an N-hydroxyalkyl (meth)acrylamide (I) represented by the following general formula (I):

(where R 1 represents a hydrogen atom or a methyl group and R 2 represents a C 2-4 straight-chain or branched alkylene group);

(B) from 2 to 20 mass % of (meth)acryloyl morpholine (II) represented by the following formula (II):

(where R 3 represents a hydrogen atom or a methyl group);

(C) from 3 to 30 mass % of a (meth)acrylate compound containing at least one (meth)acryloyloxy group;

(D) from 40 to 90 mass % of a polyhydroxy compound having two or more hydroxyl groups; and

(E) from 0.1 to 5 mass % of a photo-radical polymerization initiator.

2. The photocurable resin composition for forming the support regions according to claim 1 , wherein a combined content of said N-hydroxyalkyl (meth)acrylamide (I) and said (meth)acryloyl morpholine (II) is from 5 to 40 mass %, based on the total mass of the photocurable resin composition for forming said support regions.

3. The photocurable resin composition for forming the support regions according to claim 1 , wherein said component (C) is a (meth)acrylate compound having a (meth)acryloyloxy group and an aliphatic polyether structure.

4. The photocurable resin composition for forming the support regions according to claim 1 , wherein said component (D) is a non-curable polyhydroxy compound of molecular weight no more than 2000.

5. The photocurable resin composition for forming the support regions according to claim 1 , wherein the total mass of the photocurable resin composition for forming said support resin comprises as part of said component (D) from 2 to 10 mass % of diglycerol.

Assignments (2)
CHANGE OF NAME Recorded Jan 17, 2017
From: I-SQUARED GMBH
To: ISQUARED GMBH
Reel/Frame 041551/0179 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 13, 2016
From: STEPPER, JAN-MICHAEL; HAGIWARA, TSUNEO
To: I-SQUARED GMBH
Reel/Frame 039709/0633 →
Priority Claims (1)
JP 2014-061175 · Mar 25, 2014 · national
Continuity (1)
Related Publication 20170001382A1 · Jan 5, 2017