IP Library Granted Patent US 9,715,991
Granted Patent B2
US 9,715,991 · App. 15/125,989 · Granted Jul 25, 2017

Charged particle beam device and spherical aberration correction method

Inventors: Yoichi Hirayama (Tokyo, JP); Hirokazu Tamaki (Tokyo, JP)
Assignee: Hitachi High-Technologies Corporation
H01J37/153H01J37/14H01J37/26H01J2237/1534H01J2237/2802
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Quick Facts
Patent No.
US 9,715,991
App. No.
15/125,989
Granted
Jul 25, 2017
Kind
B2
Abstract

In general, in a multipole lens of an aberration corrector of a charged particle beam device, there is only one condition that can be set where both a spherical aberration correction condition and magnetic saturation are satisfied. Therefore, a plurality of acceleration voltages cannot be handled. Consequently, the present invention provides a spherical aberration corrector that satisfies the magnetic saturation state for a plurality of aberration correction conditions by selectively magnetizing a plurality of pole groups of the multipole lens according to the changes in the objective lens magnetization current.

Claims (34)

1. A charged particle beam device comprising:

a charged particle beam source;

a charged particle optical system that irradiates a specimen with charged particle beams which are formed of charged particles released from the charged particle source;

an objective lens that focuses the charged particle beams;

a spherical aberration corrector that satisfies a magnetically saturated state in multiple aberration correction conditions by selectively magnetizing multiple sets of pole groups of a multipole lens according to a change in magnetization current of the objective lens; and

a control unit that controls the charged particle optical system and the spherical aberration corrector.

2. The charged particle beam device according to claim 1 ,

wherein the multiple aberration correction conditions respectively correspond to multiple acceleration voltages.

3. The charged particle beam device according to claim 1 ,

wherein the multiple aberration correction conditions respectively correspond to multiple pole piece shapes of the objective lens.

4. The charged particle beam device according to claim 1 ,

wherein the multipole lens is a 12-pole lens including 12 poles, and

wherein a first aberration correction condition is satisfied by magnetizing a first pole group including six poles of the 12 poles, a second aberration correction condition is satisfied by magnetizing a second pole group including other six poles, and a third aberration correction condition is satisfied by magnetizing all the 12 poles.

5. The charged particle beam device according to claim 1 ,

wherein the multipole lens is a multipole lens including 12 or more poles, and

wherein a first aberration correction condition is satisfied by magnetizing a first pole group including six poles of the 12 or more poles, and one or multiple other aberration correction conditions are satisfied by selectively magnetizing a pole group including poles apart from the six poles, or another pole group including the six poles.

6. The charged particle beam device according to claim 1 ,

wherein the multipole lens is a 12-pole lens including 12 poles, and

wherein a first aberration correction condition is satisfied by magnetizing a first pole group including six poles of the 12 poles, and a second aberration correction condition is satisfied by magnetizing a second pole group including other six poles.

7. A spherical aberration correction method of a charged particle beam device including a charged particle beam source; a charged particle optical system that irradiates a specimen with charged particle beams which are formed of charged particles released from the charged particle source; an objective lens that focuses the charged particle beams; a spherical aberration corrector that corrects a spherical aberration of the charged particle optical system; and a control unit that controls the charged particle optical system and the spherical aberration corrector,

wherein the control unit satisfies a magnetically saturated state in multiple aberration correction conditions by selectively magnetizing multiple sets of pole groups of a multipole lens according to a change in magnetization current of the objective lens.

8. The spherical aberration correction method according to claim 7 ,

wherein the control unit controls the spherical aberration corrector according to a change in acceleration voltage.

9. The spherical aberration correction method according to claim 7 ,

wherein the control unit controls the spherical aberration corrector according to a change in the pole piece shape of the objective lens.

10. The spherical aberration correction method according to claim 7 ,

wherein the multipole lens is a 12-pole lens including 12 poles, and

wherein the control unit magnetizes a first pole group including six poles of the 12 poles such that a first aberration correction condition is satisfied, the control unit magnetizes a second pole group including other six poles such that a second aberration correction condition is satisfied, and the control unit magnetizes all the 12 poles such that a third aberration correction condition is satisfied.

11. The spherical aberration correction method according to claim 7 ,

wherein the multipole lens is a multipole lens including 12 or more poles, and

wherein the control unit magnetizes a first pole group including six poles of the 12 or more poles such that a first aberration correction condition is satisfied, and the control unit selectively magnetizes a pole group including poles apart from the six poles, or another pole group including the six poles such that one or multiple other aberration correction conditions are satisfied.

12. The spherical aberration correction method according to claim 7 ,

wherein the multipole lens is a 12-pole lens including 12 poles, and

wherein the control unit magnetizes a first pole group including six poles of the 12 poles such that a first aberration correction condition is satisfied, and the control unit magnetizes a second pole group including other six poles such that a second aberration correction condition is satisfied.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 14, 2016
From: HIRAYAMA, YOICHI; TAMAKI, HIROKAZU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 039739/0973 →
Continuity (1)
Related Publication 20170117115A1 · Apr 27, 2017